The influence of substrate emissivity on plasma enhanced CVD of diamond-like carbon films

ZAJÍČKOVÁ, Lenka, Vilma BURŠÍKOVÁ and Daniel FRANTA. The influence of substrate emissivity on plasma enhanced CVD of diamond-like carbon films. Czechoslovak Journal of Physics. Praha, 1999, vol. 49, No 8, p. 1213-1228. ISSN 0011-4626.

Basic information

• Original name: The influence of substrate emissivity on plasma enhanced CVD of diamond-like carbon films
• Authors: ZAJÍČKOVÁ, Lenka (203 Czech Republic, guarantor), Vilma BURŠÍKOVÁ (203 Czech Republic) and Daniel FRANTA (203 Czech Republic).
• Edition: Czechoslovak Journal of Physics, Praha, 1999, 0011-4626.

Other information

• Original language: English
• Type of outcome: Article in a journal
• Field of Study: 10305 Fluids and plasma physics
• Country of publisher: Czech Republic
• Confidentiality degree: is not subject to a state or trade secret
• WWW: URL
• Impact factor: Impact factor: 0.328
• RIV identification code: RIV/00216224:14310/99:00001115
• Organization unit: Faculty of Science
• UT WoS: 000082265000008
• Tags: International impact, Reviewed

Abstract

In a planar capacitively coupled RF reactor we deposited DLC films from the mixture of methane and argon. The self biased electrode was in a poor thermal contact with walls of the reactor, neither water cooled nor electrical heated by a special external circuit. The temperatures were continuously increasing even during the longest deposition time of 120 min and differed for the electrode and the silicons of different specific resistances correlated to their emissivities. Ellipsometric and reflectance measurements of films deposited on two different silicon substrates of different emissivities were carried out. Their deposition rate depended significantly on the silicon emissivities because of the different temperatures. The influence of the silicon substrate emissivity on the mechanical properties of DLC films were studied by means of Vickers microhardness tester.

Links

• GV106/96/K245, research and development project: Name: Tvrdé a supertvrdé povlaky vytvořené nekonvenčními plazmovými procesy

Investor: Czech Science Foundation, Hard and superhard coatings prepared by unconventional plasma processes

• MSM 143100003, plan (intention): Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates