Complete Optical Characterization of the SiO2/Si System by Spectroscopic Ellipsometry Spectroscopic Reflectometry and Atomic Force Microscopy

OHLÍDAL, Ivan, Daniel FRANTA, Emil PINČÍK and Miloslav OHLÍDAL. Complete Optical Characterization of the SiO2/Si System by Spectroscopic Ellipsometry Spectroscopic Reflectometry and Atomic Force Microscopy. Surface and Interface Analysis. USA: John Wiley & Sons, 1999, vol. 28, No 1, p. 240-244. ISSN 0142-2421.

Basic information

• Original name: Complete Optical Characterization of the SiO2/Si System by Spectroscopic Ellipsometry Spectroscopic Reflectometry and Atomic Force Microscopy
• Authors: OHLÍDAL, Ivan (203 Czech Republic, guarantor), Daniel FRANTA (203 Czech Republic), Emil PINČÍK and Miloslav OHLÍDAL.
• Edition: Surface and Interface Analysis, USA, John Wiley & Sons, 1999, 0142-2421.

Other information

• Original language: English
• Type of outcome: Article in a journal
• Field of Study: 10302 Condensed matter physics
• Country of publisher: United States of America
• Confidentiality degree: is not subject to a state or trade secret
• WWW: URL
• Impact factor: Impact factor: 1.705
• RIV identification code: RIV/00216224:14310/99:00002109
• Organization unit: Faculty of Science
• Keywords in English: Optical constants of Si and SiO2; Spectrosopic reflectometry; Spectroscopic ellipsometry
• Tags: spectroscopic ellipsometry, Spectrosopic reflectometry

Abstract

In this paper results concerning the optical analysis of the system SiO2/Si performed by the combined ellipsometric and reflectometric method used in the multiple-sample modification will be presented. This method is based on combining both the single-wavelength method and dispersion method. Three models of the system mentioned, i.e. the model of the substrate and the layer with the smooth boundaries, the same model with transition layer and the model of the substrate and the layer with rough boundaries, will be used to interpret the experimental data. The spectral dependences of the optical constants of silicon and SiO2 with the values of the other parameters will be determined. It will be shown that the simplest model with the smooth boundary is the most convenient with the experimental data.

Links

• GA202/98/0988, research and development project: Name: Charakterizace vrstevnatých systémů s náhodně drsnými rozhraními pomocí optických a rtg metod

Investor: Czech Science Foundation, Characterization of multilayer systems with randomly rough boundaries by means of optical and X - ray methods

• VS96084, research and development project: Name: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze

Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague