Detailed Information on Publication Record
1999
Relationship Between AFM and Optical Measurements at Analyzing Surface Roughness
OHLÍDAL, Ivan, Daniel FRANTA, Petr KLAPETEK and Martin VIČARBasic information
Original name
Relationship Between AFM and Optical Measurements at Analyzing Surface Roughness
Authors
OHLÍDAL, Ivan (203 Czech Republic, guarantor), Daniel FRANTA (203 Czech Republic), Petr KLAPETEK (203 Czech Republic) and Martin VIČAR (203 Czech Republic)
Edition
Jemná mechanika a optika, Přerov, Physical Institute, ASCR, 1999, 0447-6441
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10306 Optics
Country of publisher
Czech Republic
Confidentiality degree
není předmětem státního či obchodního tajemství
References:
RIV identification code
RIV/00216224:14310/99:00002111
Organization unit
Faculty of Science
Změněno: 22/12/2003 00:17, Mgr. Daniel Franta, Ph.D.
Abstract
V originále
In this paper a comparison of the values of the basic surface roughness parameters determined by atomic force microscopy and a combined optical method is performed for a chosen sample of SiO2-film with identically randomly rough boundaries placed onto a silicon single crystal wafer. The combined optical method is based on simultaneous interpretation of the experimental data corresponding to variable angle spectroscopic ellipsometry and near-normal spectroscopic reflectometry. It is shown that the comparison of the results achieved using both the methods mentioned can be successfully performed if the influence influence of individual spatial frequencies of the harmonic components of random surface roughness on the optical quantities measured is based into account.
Links
GA202/98/0988, research and development project |
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GV106/96/K245, research and development project |
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VS96084, research and development project |
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