Higher harmonic frequencies of discharge voltage and current in
a capacitively coupled plasma

p 2022

Higher harmonic frequencies of discharge voltage and current in a capacitively coupled plasma

DVOŘÁK, Pavel, Radek ŽEMLIČKA, Roman PŘIBYL, Maroš TKÁČIK, Juraj PÁLENIK et. al.

Basic information

Original name

Higher harmonic frequencies of discharge voltage and current in a capacitively coupled plasma

Name in Czech

Vyšší harmonické frekvence výbojového napětí a proudu v kapacitně vázaném plazmatu

Authors

DVOŘÁK, Pavel (203 Czech Republic, guarantor, belonging to the institution), Radek ŽEMLIČKA (203 Czech Republic), Roman PŘIBYL (203 Czech Republic, belonging to the institution), Maroš TKÁČIK (703 Slovakia), Juraj PÁLENIK (703 Slovakia), Petr VAŠINA (203 Czech Republic, belonging to the institution), Petr SKOPAL (203 Czech Republic, belonging to the institution), Zdeněk NAVRÁTIL (203 Czech Republic, belonging to the institution) and Vilma BURŠÍKOVÁ (203 Czech Republic, belonging to the institution)

Edition

31st SPIG (Summer school and International Symposium on the Physics of Ionized Gases), 2022

Other information

Language

English

Type of outcome

Vyžádané přednášky

Field of Study

10305 Fluids and plasma physics

Country of publisher

Czech Republic

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

Organization unit

Faculty of Science

Keywords (in Czech)

vyšší harmonické frekvence;plazma;kapacitně vázané výboje

Keywords in English

higher harmonic frequencies;plasma;capacitively coupled discharges

Abstract

ORIG CZ

V originále

The current-voltage characteristics of capacitively coupled discharges has nonlinear character, which is caused by sheaths and which leads to generation of higher harmonic frequencies of discharge current and voltage. Higher harmonics are strong especially at low pressure. Higher harmonics influence the behaviour of the plasma and, at the same time, they sensitively react on number of discharge parameters, which enables to use them for monitoring of various deposition and etching processes. The presentation summarizes several topics related to higher harmonic frequencies, namely the problematics of probe measurement of the high-frequency components of plasma potential, modeling of generation of higher harmonics and analysis why higher harmonics react so sensitively on the presence of a thin film during deposition/etching processes.

In Czech

Zvaná přednáška shrnula několik let výzkumu vyšších harmonických frekvencí, které jsou spontánně generované v kapacitně vázaném plazmatu díky nelinearitě elektrických vlastností plazmatu. Přednáška shrnula vznik vyšších harmonických frekvencí, způsob jejich měření a problematiku Langmuirovy sondy bez vf. kompenzace, výpočet vyšších harmonických měření a jejich chování v řadě případů a na závěr důvod reakce vyšších harmonik na vznik nebo odleptání tenké vrstvy v plazmatických procesech.

Links

GA19-15240S, research and development project

Name: Multifunkční nanokompozitní polymerní tenké vrstvy s řízenými povrchovými a mechanickými vlastnostmi připravené v RF prachovém plazmatu

Investor: Czech Science Foundation

90097, large research infrastructures

Name: CEPLANT

Citovat

DVOŘÁK, Pavel, Radek ŽEMLIČKA, Roman PŘIBYL, Maroš TKÁČIK, Juraj PÁLENIK, Petr VAŠINA, Petr SKOPAL, Zdeněk NAVRÁTIL and Vilma BURŠÍKOVÁ. Higher harmonic frequencies of discharge voltage and current in a capacitively coupled plasma. In 31st SPIG (Summer school and International Symposium on the Physics of Ionized Gases). 2022.

@misc{2217417,
   author = {Dvořák, Pavel and Žemlička, Radek and Přibyl, Roman and Tkáčik, Maroš and Pálenik, Juraj and Vašina, Petr and Skopal, Petr and Navrátil, Zdeněk and Buršíková, Vilma},
   booktitle = {31st SPIG (Summer school and International Symposium on the Physics of Ionized Gases)},
   keywords = {higher harmonic frequencies;plasma;capacitively coupled discharges},
   language = {eng},
   note = {Součástí publikace je také krátký abstrakt v konferenčním sborníku: Publ. Astron. Obs. Belgrade 102 (2022), 160. Poděkování patří i VVI LM2018097.},
   title = {Higher harmonic frequencies of discharge voltage and current in a capacitively coupled plasma},
   url = {https://publications.aob.rs/102/pdf/spig2022-23-8.pdf},
   year = {2022}
}

TY  - SLIDE
ID  - 2217417
AU  - Dvořák, Pavel - Žemlička, Radek - Přibyl, Roman - Tkáčik, Maroš - Pálenik, Juraj - Vašina, Petr - Skopal, Petr - Navrátil, Zdeněk - Buršíková, Vilma
PY  - 2022
TI  - Higher harmonic frequencies of discharge voltage and current in a capacitively coupled plasma
N1  - Součástí publikace je také krátký abstrakt v konferenčním sborníku: Publ. Astron. Obs. Belgrade 102 (2022), 160. Poděkování patří i VVI LM2018097.
KW  - higher harmonic frequencies;plasma;capacitively coupled discharges
UR  - https://publications.aob.rs/102/pdf/spig2022-23-8.pdf
N2  - The current-voltage characteristics of capacitively coupled discharges has nonlinear character, which is caused by sheaths and which leads to generation of higher harmonic frequencies of discharge current and voltage. Higher harmonics are strong especially at low pressure. Higher harmonics influence the behaviour of the plasma and, at the same time, they sensitively react on number of discharge parameters, which enables to use them for monitoring of various deposition and etching processes. The presentation summarizes several topics related to higher harmonic frequencies, namely the problematics of probe measurement of the high-frequency components of plasma potential, modeling of generation of higher harmonics and analysis why higher harmonics react so sensitively on the presence of a thin film during deposition/etching processes.
ER  -

DVOŘÁK, Pavel, Radek ŽEMLIČKA, Roman PŘIBYL, Maroš TKÁČIK, Juraj PÁLENIK, Petr VAŠINA, Petr SKOPAL, Zdeněk NAVRÁTIL and Vilma BURŠÍKOVÁ. Higher harmonic frequencies of discharge voltage and current in a capacitively coupled plasma. In \textit{31st SPIG (Summer school and International Symposium on the Physics of Ionized Gases)}. 2022.

Detailed Information on Publication Record