JANČA, Jan, Lenka ZAJÍČKOVÁ, Miloš KLÍMA and Pavel SLAVÍČEK. HF plasma pencil- new source for plasma surface processing. Surface and coating technology. New York: ELSEVIER, 1999, vol. 1999, 116-119, p. 547-551. ISSN 0257-8972. |
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@article{223891, author = {Janča, Jan and Zajíčková, Lenka and Klíma, Miloš and Slavíček, Pavel}, article_location = {New York}, article_number = {116-119}, keywords = {plasma pencil; atmospheric discharge; diagnostic}, language = {eng}, issn = {0257-8972}, journal = {Surface and coating technology}, title = {HF plasma pencil- new source for plasma surface processing}, volume = {1999}, year = {1999} }
TY - JOUR ID - 223891 AU - Janča, Jan - Zajíčková, Lenka - Klíma, Miloš - Slavíček, Pavel PY - 1999 TI - HF plasma pencil- new source for plasma surface processing JF - Surface and coating technology VL - 1999 IS - 116-119 SP - 547 EP - 547 PB - ELSEVIER SN - 02578972 KW - plasma pencil KW - atmospheric discharge KW - diagnostic N2 - HF plasma pencil=new source for plasma surface treatment. ER -
JANČA, Jan, Lenka ZAJÍČKOVÁ, Miloš KLÍMA and Pavel SLAVÍČEK. HF plasma pencil- new source for plasma surface processing. \textit{Surface and coating technology}. New York: ELSEVIER, 1999, vol.~1999, 116-119, p.~547-551. ISSN~0257-8972.
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