J 1999

HF plasma pencil- new source for plasma surface processing

JANČA, Jan, Lenka ZAJÍČKOVÁ, Miloš KLÍMA and Pavel SLAVÍČEK

Basic information

Original name

HF plasma pencil- new source for plasma surface processing

Authors

JANČA, Jan (203 Czech Republic, guarantor), Lenka ZAJÍČKOVÁ (203 Czech Republic), Miloš KLÍMA (203 Czech Republic) and Pavel SLAVÍČEK (203 Czech Republic)

Edition

Surface and coating technology, New York, ELSEVIER, 1999, 0257-8972

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

United States of America

Confidentiality degree

není předmětem státního či obchodního tajemství

Impact factor

Impact factor: 1.008

RIV identification code

RIV/00216224:14310/99:00001481

Organization unit

Faculty of Science

Keywords in English

plasma pencil; atmospheric discharge; diagnostic

Tags

Tags

International impact, Reviewed
Změněno: 20/12/2008 16:13, Mgr. Miloš Klíma, Ph.D.

Abstract

V originále

HF plasma pencil=new source for plasma surface treatment.

Links

GV106/96/K245, research and development project
Name: Tvrdé a supertvrdé povlaky vytvořené nekonvenčními plazmovými procesy
Investor: Czech Science Foundation, Hard and superhard coatings prepared by unconventional plasma processes
MSM 143100003, plan (intention)
Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
VS96084, research and development project
Name: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze
Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague