JANČA, Jan, Lenka ZAJÍČKOVÁ, Miloš KLÍMA and Pavel SLAVÍČEK. HF plasma pencil- new source for plasma surface processing. Surface and coating technology. New York: ELSEVIER, 1999, vol. 1999, 116-119, p. 547-551. ISSN 0257-8972.
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Basic information
Original name HF plasma pencil- new source for plasma surface processing
Authors JANČA, Jan (203 Czech Republic, guarantor), Lenka ZAJÍČKOVÁ (203 Czech Republic), Miloš KLÍMA (203 Czech Republic) and Pavel SLAVÍČEK (203 Czech Republic).
Edition Surface and coating technology, New York, ELSEVIER, 1999, 0257-8972.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher United States of America
Confidentiality degree is not subject to a state or trade secret
Impact factor Impact factor: 1.008
RIV identification code RIV/00216224:14310/99:00001481
Organization unit Faculty of Science
Keywords in English plasma pencil; atmospheric discharge; diagnostic
Tags atmospheric discharge, diagnostic, plasma pencil
Tags International impact, Reviewed
Changed by Changed by: Mgr. Miloš Klíma, Ph.D., učo 1606. Changed: 20/12/2008 16:13.
Abstract
HF plasma pencil=new source for plasma surface treatment.
Links
GV106/96/K245, research and development projectName: Tvrdé a supertvrdé povlaky vytvořené nekonvenčními plazmovými procesy
Investor: Czech Science Foundation, Hard and superhard coatings prepared by unconventional plasma processes
MSM 143100003, plan (intention)Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
VS96084, research and development projectName: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze
Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague
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