Influence of the argon ratio on the structure and properties of
thin films prepared using PECVD in TMSAc/Ar mixtures

J 2023

Influence of the argon ratio on the structure and properties of thin films prepared using PECVD in TMSAc/Ar mixtures

KELAROVÁ, Štěpánka, Roman PŘIBYL, Vojtěch HOMOLA, Josef POLČÁK, Anna CHARVÁTOVÁ CAMPBELL et. al.

Basic information

Original name

Influence of the argon ratio on the structure and properties of thin films prepared using PECVD in TMSAc/Ar mixtures

Authors

KELAROVÁ, Štěpánka (203 Czech Republic, guarantor, belonging to the institution), Roman PŘIBYL (203 Czech Republic, belonging to the institution), Vojtěch HOMOLA (203 Czech Republic, belonging to the institution), Josef POLČÁK, Anna CHARVÁTOVÁ CAMPBELL, Marek HAVLÍČEK, Kateřina VRCHOVECKÁ (203 Czech Republic, belonging to the institution), Richard VÁCLAVIK (703 Slovakia, belonging to the institution), Lukáš ZÁBRANSKÝ (203 Czech Republic, belonging to the institution) and Vilma BURŠÍKOVÁ (203 Czech Republic, belonging to the institution)

Edition

Vacuum, Elsevier, 2023, 0042-207X

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

Impact factor

Impact factor: 4.000 in 2022

RIV identification code

RIV/00216224:14310/23:00130104

Organization unit

Faculty of Science

DOI

http://dx.doi.org/10.1016/j.vacuum.2022.111634

UT WoS

000890335800005

Keywords in English

Trimethylsilyl acetate; PECVD; Low pressure RF glow discharge; Plasma polymers; Stability

Abstract

V originále

Capacitively coupled RF glow discharge was used to form novel coatings of SiOxCyHz using varying proportions of trimethylsilyl acetate (TMSAc) monomer and the carrier gas argon. The properties of the TMSAc-based plasma polymers produced depend significantly on the proportion of argon in TMSAc/Ar gaseous mixture, which ranged from 0 % to 75 %. Reaction mixtures containing less than 50 % Ar produced hydrophobic polymers, for which the indentation hardness values were less than 1.5 GPa. Seventy-five percent argon in the reaction mixture yielded a crosslinked carbon-rich organosilicon structure with a hardness of 6 GPa. As many applications require good stability in a liquid environment, the TMSAc-based coatings were immersed in phosphate buffered saline (PBS) for 14 days. Because any material used in a medical application must be resistant to the techniques used for sterilization, the prepared coatings were subjected to a standard sterilization procedure using UVC radiation. A degree of the structural changes induced by both environments corresponded to the argon ratio used for production of thin films. Possible degradation mechanisms were examined and discussed. Using 7.7–21.4 % Ar during the deposition process led to the TMSAc-based plasma polymers exhibiting good resistance to the prolonged immersion in PBS and UVC sterilization.

Links

GA19-15240S, research and development project

Name: Multifunkční nanokompozitní polymerní tenké vrstvy s řízenými povrchovými a mechanickými vlastnostmi připravené v RF prachovém plazmatu

Investor: Czech Science Foundation

NU20-08-00149, research and development project

Name: Multicentrické hodnocení hypersenzitivní reakce u pacientů indikovaných k totální náhradě kloubu včetně hodnocení důvodů reimplanace

Investor: Ministry of Health of the CR, Subprogram 1 - standard

90097, large research infrastructures

Name: CEPLANT

90110, large research infrastructures

Name: CzechNanoLab

Citovat

KELAROVÁ, Štěpánka, Roman PŘIBYL, Vojtěch HOMOLA, Josef POLČÁK, Anna CHARVÁTOVÁ CAMPBELL, Marek HAVLÍČEK, Kateřina VRCHOVECKÁ, Richard VÁCLAVIK, Lukáš ZÁBRANSKÝ and Vilma BURŠÍKOVÁ. Influence of the argon ratio on the structure and properties of thin films prepared using PECVD in TMSAc/Ar mixtures. Vacuum. Elsevier, 2023, vol. 207, January, p. 1-12. ISSN 0042-207X. Available from: https://dx.doi.org/10.1016/j.vacuum.2022.111634.

@article{2239461,
   author = {Kelarová, Štěpánka and Přibyl, Roman and Homola, Vojtěch and Polčák, Josef and Charvátová Campbell, Anna and Havlíček, Marek and Vrchovecká, Kateřina and Václavik, Richard and Zábranský, Lukáš and Buršíková, Vilma},
   article_number = {January},
   doi = {http://dx.doi.org/10.1016/j.vacuum.2022.111634},
   keywords = {Trimethylsilyl acetate; PECVD; Low pressure RF glow discharge; Plasma polymers; Stability},
   language = {eng},
   issn = {0042-207X},
   journal = {Vacuum},
   title = {Influence of the argon ratio on the structure and properties of thin films prepared using PECVD in TMSAc/Ar mixtures},
   url = {https://www.sciencedirect.com/science/article/pii/S0042207X22007564},
   volume = {207},
   year = {2023}
}

TY  - JOUR
ID  - 2239461
AU  - Kelarová, Štěpánka - Přibyl, Roman - Homola, Vojtěch - Polčák, Josef - Charvátová Campbell, Anna - Havlíček, Marek - Vrchovecká, Kateřina - Václavik, Richard - Zábranský, Lukáš - Buršíková, Vilma
PY  - 2023
TI  - Influence of the argon ratio on the structure and properties of thin films prepared using PECVD in TMSAc/Ar mixtures
JF  - Vacuum
VL  - 207
IS  - January
SP  - 1-12
EP  - 1-12
PB  - Elsevier
SN  - 0042207X
KW  - Trimethylsilyl acetate
KW  - PECVD
KW  - Low pressure RF glow discharge
KW  - Plasma polymers
KW  - Stability
UR  - https://www.sciencedirect.com/science/article/pii/S0042207X22007564
N2  - Capacitively coupled RF glow discharge was used to form novel coatings of SiOxCyHz using varying proportions of trimethylsilyl acetate (TMSAc) monomer and the carrier gas argon. The properties of the TMSAc-based plasma polymers produced depend significantly on the proportion of argon in TMSAc/Ar gaseous mixture, which ranged from 0 % to 75 %. Reaction mixtures containing less than 50 % Ar produced hydrophobic polymers, for which the indentation hardness values were less than 1.5 GPa. Seventy-five percent argon in the reaction mixture yielded a crosslinked carbon-rich organosilicon structure with a hardness of 6 GPa. As many applications require good stability in a liquid environment, the TMSAc-based coatings were immersed in phosphate buffered saline (PBS) for 14 days. Because any material used in a medical application must be resistant to the techniques used for sterilization, the prepared coatings were subjected to a standard sterilization procedure using UVC radiation. A degree of the structural changes induced by both environments corresponded to the argon ratio used for production of thin films. Possible degradation mechanisms were examined and discussed. Using 7.7–21.4 % Ar during the deposition process led to the TMSAc-based plasma polymers exhibiting good resistance to the prolonged immersion in PBS and UVC sterilization.
ER  -

KELAROVÁ, Štěpánka, Roman PŘIBYL, Vojtěch HOMOLA, Josef POLČÁK, Anna CHARVÁTOVÁ CAMPBELL, Marek HAVLÍČEK, Kateřina VRCHOVECKÁ, Richard VÁCLAVIK, Lukáš ZÁBRANSKÝ and Vilma BURŠÍKOVÁ. Influence of the argon ratio on the structure and properties of thin films prepared using PECVD in TMSAc/Ar mixtures. \textit{Vacuum}. Elsevier, 2023, vol.~207, January, p.~1-12. ISSN~0042-207X. Available from: https://dx.doi.org/10.1016/j.vacuum.2022.111634.

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