Detailed Information on Publication Record
2022
Depth profiling of thin plasma-polymerized amine films using GDOES in an Ar-O-2 plasma
KOVAČ, Janez, Jernej EKAR, Miha ČEKADA, Lenka ZAJÍČKOVÁ, David NEČAS et. al.Basic information
Original name
Depth profiling of thin plasma-polymerized amine films using GDOES in an Ar-O-2 plasma
Authors
KOVAČ, Janez (guarantor), Jernej EKAR, Miha ČEKADA, Lenka ZAJÍČKOVÁ (203 Czech Republic, belonging to the institution), David NEČAS, Lucie BLAHOVÁ, Jiang Yong WANG and Miran MOZETIC
Edition
Applied Surface Science, Elsevier, 2022, 0169-4332
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10302 Condensed matter physics
Country of publisher
Netherlands
Confidentiality degree
není předmětem státního či obchodního tajemství
References:
Impact factor
Impact factor: 6.700
RIV identification code
RIV/00216224:14310/22:00127772
Organization unit
Faculty of Science
UT WoS
000799074500006
Keywords in English
GDOES; Depth profile; Amine plasma polymer; Ar-O-2 plasma
Tags
Tags
International impact, Reviewed
Změněno: 15/2/2023 18:07, doc. Mgr. Lenka Zajíčková, Ph.D.
Abstract
V originále
Thin polymer films were deposited on polished stainless-steel samples by PECVD from a cyclopropylamine precursor and characterized by X-ray photoelectron spectroscopy, secondary-ion mass spectrometry and glow-discharge optical emission spectroscopy (GDOES) depth profiling. These depth profiles exhibited reasonable agreement. The GDOES involved the erosion of the polymer films in plasma sustained by an asymmetric RF capacitively coupled discharge using both Ar and Ar-O2 gases. The application of pure Ar caused unwanted effects, such as the broadening of the polymer-film/substrate interface, which were suppressed when using the mixture with oxygen. Another benefit of oxygen was a significant increase in the etching rate by a factor of about 15 as compared to pure argon. The mechanisms involved in the depth profiling using the mixture of gases were elaborated in some detail, taking into account plasma parameters typical for an asymmetric, capacitively coupled RF discharge in a small volume. The main benefit of using the Ar/O2 GDOES profiling with respect to XPS and SIMS depth profiling is the increased sputtering rate for polymer films. Comparing the GDOES depth profiling with the Ar/O2 mixture with profiling in pure Ar, the benefits are a higher sputtering rate and better depth resolution at the polymer/substrate interface.
Links
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