Depth profiling of thin plasma-polymerized amine films using
GDOES in an Ar-O-2 plasma

J 2022

Depth profiling of thin plasma-polymerized amine films using GDOES in an Ar-O-2 plasma

KOVAČ, Janez, Jernej EKAR, Miha ČEKADA, Lenka ZAJÍČKOVÁ, David NEČAS et. al.

Basic information

Original name

Depth profiling of thin plasma-polymerized amine films using GDOES in an Ar-O-2 plasma

Authors

KOVAČ, Janez (guarantor), Jernej EKAR, Miha ČEKADA, Lenka ZAJÍČKOVÁ (203 Czech Republic, belonging to the institution), David NEČAS, Lucie BLAHOVÁ, Jiang Yong WANG and Miran MOZETIC

Edition

Applied Surface Science, Elsevier, 2022, 0169-4332

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10302 Condensed matter physics

Country of publisher

Netherlands

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

Impact factor

Impact factor: 6.700

RIV identification code

RIV/00216224:14310/22:00127772

Organization unit

Faculty of Science

DOI

http://dx.doi.org/10.1016/j.apsusc.2021.152292

UT WoS

000799074500006

Keywords in English

GDOES; Depth profile; Amine plasma polymer; Ar-O-2 plasma

Abstract

V originále

Thin polymer films were deposited on polished stainless-steel samples by PECVD from a cyclopropylamine precursor and characterized by X-ray photoelectron spectroscopy, secondary-ion mass spectrometry and glow-discharge optical emission spectroscopy (GDOES) depth profiling. These depth profiles exhibited reasonable agreement. The GDOES involved the erosion of the polymer films in plasma sustained by an asymmetric RF capacitively coupled discharge using both Ar and Ar-O2 gases. The application of pure Ar caused unwanted effects, such as the broadening of the polymer-film/substrate interface, which were suppressed when using the mixture with oxygen. Another benefit of oxygen was a significant increase in the etching rate by a factor of about 15 as compared to pure argon. The mechanisms involved in the depth profiling using the mixture of gases were elaborated in some detail, taking into account plasma parameters typical for an asymmetric, capacitively coupled RF discharge in a small volume. The main benefit of using the Ar/O2 GDOES profiling with respect to XPS and SIMS depth profiling is the increased sputtering rate for polymer films. Comparing the GDOES depth profiling with the Ar/O2 mixture with profiling in pure Ar, the benefits are a higher sputtering rate and better depth resolution at the polymer/substrate interface.

Links

90110, large research infrastructures

Name: CzechNanoLab

Citovat

KOVAČ, Janez, Jernej EKAR, Miha ČEKADA, Lenka ZAJÍČKOVÁ, David NEČAS, Lucie BLAHOVÁ, Jiang Yong WANG and Miran MOZETIC. Depth profiling of thin plasma-polymerized amine films using GDOES in an Ar-O-2 plasma. Applied Surface Science. Elsevier, 2022, vol. 581, April, p. 1-10. ISSN 0169-4332. Available from: https://dx.doi.org/10.1016/j.apsusc.2021.152292.

@article{2244093,
   author = {Kovač, Janez and Ekar, Jernej and Čekada, Miha and Zajíčková, Lenka and Nečas, David and Blahová, Lucie and Wang, Jiang Yong and Mozetic, Miran},
   article_number = {April},
   doi = {http://dx.doi.org/10.1016/j.apsusc.2021.152292},
   keywords = {GDOES; Depth profile; Amine plasma polymer; Ar-O-2 plasma},
   language = {eng},
   issn = {0169-4332},
   journal = {Applied Surface Science},
   title = {Depth profiling of thin plasma-polymerized amine films using GDOES in an Ar-O-2 plasma},
   url = {https://doi.org/10.1016/j.apsusc.2021.152292},
   volume = {581},
   year = {2022}
}

TY  - JOUR
ID  - 2244093
AU  - Kovač, Janez - Ekar, Jernej - Čekada, Miha - Zajíčková, Lenka - Nečas, David - Blahová, Lucie - Wang, Jiang Yong - Mozetic, Miran
PY  - 2022
TI  - Depth profiling of thin plasma-polymerized amine films using GDOES in an Ar-O-2 plasma
JF  - Applied Surface Science
VL  - 581
IS  - April
SP  - 1-10
EP  - 1-10
PB  - Elsevier
SN  - 01694332
KW  - GDOES
KW  - Depth profile
KW  - Amine plasma polymer
KW  - Ar-O-2 plasma
UR  - https://doi.org/10.1016/j.apsusc.2021.152292
N2  - Thin polymer films were deposited on polished stainless-steel samples by PECVD from a cyclopropylamine precursor and characterized by X-ray photoelectron spectroscopy, secondary-ion mass spectrometry and glow-discharge optical emission spectroscopy (GDOES) depth profiling. These depth profiles exhibited reasonable agreement. The GDOES involved the erosion of the polymer films in plasma sustained by an asymmetric RF capacitively coupled discharge using both Ar and Ar-O2 gases. The application of pure Ar caused unwanted effects, such as the broadening of the polymer-film/substrate interface, which were suppressed when using the mixture with oxygen. Another benefit of oxygen was a significant increase in the etching rate by a factor of about 15 as compared to pure argon. The mechanisms involved in the depth profiling using the mixture of gases were elaborated in some detail, taking into account plasma parameters typical for an asymmetric, capacitively coupled RF discharge in a small volume. The main benefit of using the Ar/O2 GDOES profiling with respect to XPS and SIMS depth profiling is the increased sputtering rate for polymer films. Comparing the GDOES depth profiling with the Ar/O2 mixture with profiling in pure Ar, the benefits are a higher sputtering rate and better depth resolution at the polymer/substrate interface.
ER  -

KOVAČ, Janez, Jernej EKAR, Miha ČEKADA, Lenka ZAJÍČKOVÁ, David NEČAS, Lucie BLAHOVÁ, Jiang Yong WANG and Miran MOZETIC. Depth profiling of thin plasma-polymerized amine films using GDOES in an Ar-O-2 plasma. \textit{Applied Surface Science}. Elsevier, 2022, vol.~581, April, p.~1-10. ISSN~0169-4332. Available from: https://dx.doi.org/10.1016/j.apsusc.2021.152292.

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