MAGNETRON SPUTTERING DEPOSITION OF HIGH ENTROPY NITRIDES FROM
CHROMIUM-HAFNIUM-MOLYBDENUM-TANTALUM-WOLFRAM SYSTEM

D 2021

MAGNETRON SPUTTERING DEPOSITION OF HIGH ENTROPY NITRIDES FROM CHROMIUM-HAFNIUM-MOLYBDENUM-TANTALUM-WOLFRAM SYSTEM

STASIAK, Tomasz, Pavel SOUČEK, Vilma BURŠÍKOVÁ and Petr VAŠINA

Basic information

Original name

MAGNETRON SPUTTERING DEPOSITION OF HIGH ENTROPY NITRIDES FROM CHROMIUM-HAFNIUM-MOLYBDENUM-TANTALUM-WOLFRAM SYSTEM

Authors

STASIAK, Tomasz (616 Poland, belonging to the institution), Pavel SOUČEK (203 Czech Republic, belonging to the institution), Vilma BURŠÍKOVÁ (203 Czech Republic, belonging to the institution) and Petr VAŠINA (203 Czech Republic, belonging to the institution)

Edition

Ostrava, 13th International Conference on Nanomaterials - Research and Application, NANOCON 2021, p. 98-103, 6 pp. 2021

Publisher

TANGER Ltd.

Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10300 1.3 Physical sciences

Country of publisher

Czech Republic

Confidentiality degree

není předmětem státního či obchodního tajemství

Publication form

printed version "print"

References:

URL

RIV identification code

RIV/00216224:14310/21:00128613

Organization unit

Faculty of Science

ISBN

978-80-88365-00-6

ISSN

DOI

http://dx.doi.org/10.37904/nanocon.2021.4312

Keywords in English

High entropy alloys; high entropy ceramics; nitrides; magnetron sputtering deposition; thin films

Abstract

V originále

High entropy alloys (HEAs) are multicomponent materials with at least five elements close to the equiatomic ratio. The multielement composition leads to many effects that stabilize solid solution phases instead of intermetallic compounds. It results in promising mechanical properties, high thermal stability, good corrosion resistance, etc. After the discovery of HEAs in 2004, the concept only concerned metallic materials. Later, the idea was extended to high entropy ceramics (carbides, nitrides, oxides). In this study, the high entropy nitrides (HENs) from the Cr-Hf-Mo-Ta-W system were deposited by magnetron sputtering from elemental segmented targets. Two series of samples were deposited under different nitrogen flow from 0 sccm to 20 sccm at ambient temperature and 700 °C. The coatings deposited at low nitrogen flow consist predominantly of metallic and amorphous phases. At higher nitrogen flow (above 10 sccm), the coatings mainly consist of multielement face-centered cubic nitride with nanometric grain size, which lattice parameter increases with increasing nitrogen content. The chemical composition of films varies as a function of nitrogen flow and temperature. With increasing nitrogen flow and temperature, the deposition rate decreases from 67 nm min-1 at ambient temperature with no nitrogen to 38 nm min-1 at 700 °C under 20 sccm nitrogen flow. The coatings revealed high hardness up to 26.6 GPa and Young’s modulus up to 531 GPa.

Links

LM2018097, research and development project

Name: Centrum výzkumu a vývoje plazmatu a nanotechnologických povrchových úprav (Acronym: CEPLANT)

Investor: Ministry of Education, Youth and Sports of the CR

Citovat

STASIAK, Tomasz, Pavel SOUČEK, Vilma BURŠÍKOVÁ and Petr VAŠINA. MAGNETRON SPUTTERING DEPOSITION OF HIGH ENTROPY NITRIDES FROM CHROMIUM-HAFNIUM-MOLYBDENUM-TANTALUM-WOLFRAM SYSTEM. In 13th International Conference on Nanomaterials - Research and Application, NANOCON 2021. Ostrava: TANGER Ltd., 2021, p. 98-103. ISBN 978-80-88365-00-6. Available from: https://dx.doi.org/10.37904/nanocon.2021.4312.

@inproceedings{2254777,
   author = {Stasiak, Tomasz and Souček, Pavel and Buršíková, Vilma and Vašina, Petr},
   address = {Ostrava},
   booktitle = {13th International Conference on Nanomaterials - Research and Application, NANOCON 2021},
   doi = {http://dx.doi.org/10.37904/nanocon.2021.4312},
   keywords = {High entropy alloys; high entropy ceramics; nitrides; magnetron sputtering deposition; thin films},
   howpublished = {tištěná verze "print"},
   language = {eng},
   location = {Ostrava},
   isbn = {978-80-88365-00-6},
   pages = {98-103},
   publisher = {TANGER Ltd.},
   title = {MAGNETRON SPUTTERING DEPOSITION OF HIGH ENTROPY NITRIDES FROM CHROMIUM-HAFNIUM-MOLYBDENUM-TANTALUM-WOLFRAM SYSTEM},
   url = {https://doi.org/10.37904/nanocon.2021.4312},
   year = {2021}
}

TY  - JOUR
ID  - 2254777
AU  - Stasiak, Tomasz - Souček, Pavel - Buršíková, Vilma - Vašina, Petr
PY  - 2021
TI  - MAGNETRON SPUTTERING DEPOSITION OF HIGH ENTROPY NITRIDES FROM CHROMIUM-HAFNIUM-MOLYBDENUM-TANTALUM-WOLFRAM SYSTEM
PB  - TANGER Ltd.
CY  - Ostrava
SN  - 9788088365006
KW  - High entropy alloys
KW  - high entropy ceramics
KW  - nitrides
KW  - magnetron sputtering deposition
KW  - thin films
UR  - https://doi.org/10.37904/nanocon.2021.4312
N2  - High entropy alloys (HEAs) are multicomponent materials with at least five elements close to the equiatomic ratio. The multielement composition leads to many effects that stabilize solid solution phases instead of intermetallic compounds. It results in promising mechanical properties, high thermal stability, good corrosion resistance, etc. After the discovery of HEAs in 2004, the concept only concerned metallic materials. Later, the idea was extended to high entropy ceramics (carbides, nitrides, oxides). In this study, the high entropy nitrides (HENs) from the Cr-Hf-Mo-Ta-W system were deposited by magnetron sputtering from elemental segmented targets. Two series of samples were deposited under different nitrogen flow from 0 sccm to 20 sccm at ambient temperature and 700 °C. The coatings deposited at low nitrogen flow consist predominantly of metallic and amorphous phases. At higher nitrogen flow (above 10 sccm), the coatings mainly consist of multielement face-centered cubic nitride with nanometric grain size, which lattice parameter increases with increasing nitrogen content. The chemical composition of films varies as a function of nitrogen flow and temperature. With increasing nitrogen flow and temperature, the deposition rate decreases from 67 nm min-1 at ambient temperature with no nitrogen to 38 nm min-1 at 700 °C under 20 sccm nitrogen flow. The coatings revealed high hardness up to 26.6 GPa and Young’s modulus up to 531 GPa.
ER  -

STASIAK, Tomasz, Pavel SOUČEK, Vilma BURŠÍKOVÁ and Petr VAŠINA. MAGNETRON SPUTTERING DEPOSITION OF HIGH ENTROPY NITRIDES FROM CHROMIUM-HAFNIUM-MOLYBDENUM-TANTALUM-WOLFRAM SYSTEM. In \textit{13th International Conference on Nanomaterials - Research and Application, NANOCON 2021}. Ostrava: TANGER Ltd., 2021, p.~98-103. ISBN~978-80-88365-00-6. Available from: https://dx.doi.org/10.37904/nanocon.2021.4312.

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