ZAJÍČKOVÁ, Lenka, Jan JANČA and Vratislav PERINA. Characterisation of Silicon Oxide Thin Films Deposited by Plasma Enhanced CVD from Octamethylcyclotetrasiloxane/Oxygen Feeds. Thin Solid Films. New York: Elsevier, 1999, vol. 338, No 1, p. 49-59. ISSN 0042-6090/99. |
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@article{230945, author = {Zajíčková, Lenka and Janča, Jan and Perina, Vratislav}, article_location = {New York}, article_number = {1}, keywords = {PECVD; OMTS}, language = {eng}, issn = {0042-6090/99}, journal = {Thin Solid Films}, title = {Characterisation of Silicon Oxide Thin Films Deposited by Plasma Enhanced CVD from Octamethylcyclotetrasiloxane/Oxygen Feeds}, volume = {338}, year = {1999} }
TY - JOUR ID - 230945 AU - Zajíčková, Lenka - Janča, Jan - Perina, Vratislav PY - 1999 TI - Characterisation of Silicon Oxide Thin Films Deposited by Plasma Enhanced CVD from Octamethylcyclotetrasiloxane/Oxygen Feeds JF - Thin Solid Films VL - 338 IS - 1 SP - 49-59 EP - 49-59 PB - Elsevier SN - 00426090/99 KW - PECVD KW - OMTS N2 - Characterisation of Silicon Oxide Thin Films Deposited by Plasma Enhanced CVD from Octamethylcyclotetrasiloxane/Oxygen Feeds ER -
ZAJÍČKOVÁ, Lenka, Jan JANČA and Vratislav PERINA. Characterisation of Silicon Oxide Thin Films Deposited by Plasma Enhanced CVD from Octamethylcyclotetrasiloxane/Oxygen Feeds. \textit{Thin Solid Films}. New York: Elsevier, 1999, vol.~338, No~1, p.~49-59. ISSN~0042-6090/99.
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