ZAJÍČKOVÁ, Lenka, Jan JANČA and Vratislav PERINA. Characterisation of Silicon Oxide Thin Films Deposited by Plasma Enhanced CVD from Octamethylcyclotetrasiloxane/Oxygen Feeds. Thin Solid Films. New York: Elsevier, 1999, vol. 338, No 1, p. 49-59. ISSN 0042-6090/99.
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Basic information
Original name Characterisation of Silicon Oxide Thin Films Deposited by Plasma Enhanced CVD from Octamethylcyclotetrasiloxane/Oxygen Feeds
Name in Czech Charakterizace tenkých vrstev oxidu křemíku připravených metodou PECVD z oktametylcyklotetrasiloxanu ve směsi s kyslíkem
Authors ZAJÍČKOVÁ, Lenka (203 Czech Republic, guarantor), Jan JANČA (203 Czech Republic) and Vratislav PERINA.
Edition Thin Solid Films, New York, Elsevier, 1999, 0042-6090/99.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher United States of America
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/99:00002175
Organization unit Faculty of Science
UT WoS 000078758500009
Keywords in English PECVD; OMTS
Tags OMTS, PECVD
Tags International impact, Reviewed
Changed by Changed by: doc. Mgr. Lenka Zajíčková, Ph.D., učo 1414. Changed: 17/7/2007 15:09.
Abstract
Characterisation of Silicon Oxide Thin Films Deposited by Plasma Enhanced CVD from Octamethylcyclotetrasiloxane/Oxygen Feeds
Links
MSM 143100003, plan (intention)Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
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