High-power-density sputtering of industrial-scale targets: Case
study of (Al,Cr)N

J 2024

High-power-density sputtering of industrial-scale targets: Case study of (Al,Cr)N

KLIMASHIN, F. F., J. KLUSOŇ, Martin UČÍK, R. ŽEMLIČKA, M. JÍLEK et. al.

Basic information

Original name

High-power-density sputtering of industrial-scale targets: Case study of (Al,Cr)N

Authors

KLIMASHIN, F. F. (guarantor), J. KLUSOŇ, Martin UČÍK (203 Czech Republic, belonging to the institution), R. ŽEMLIČKA, M. JÍLEK, A. LÜMKEMANN, J. MICHLER and T. E. J. EDWARDS

Edition

Materials and Design, Elsevier, 2024, 0264-1275

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10300 1.3 Physical sciences

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

Impact factor

Impact factor: 8.400 in 2022

Organization unit

Faculty of Science

DOI

http://dx.doi.org/10.1016/j.matdes.2023.112553

UT WoS

001137797200001

Keywords in English

Movable magnetron; High-power-density sputtering; AlCrN; Microstructure; Fracture toughness; Cutting performance

Abstract

V originále

Large-scale sputter-deposition of hard protective coatings has not been prevalent as the large dimensions of the industrial targets posed an enormous technological challenge: only relatively low power (and plasma) densities could be achieved, resulting ultimately in poor performance of such coatings. Here, we introduce a novel sputtering technology allowing to reach high power densities for industrial tubular targets. This is realised on the principle of a longitudinal movement of a reduced-size magnetron inside the target. In doing so, peak power densities of 840 W/cm2 have been achieved for the overall power of 25 kW and the target dimensions of Ø110 × 510 mm. To demonstrate the effectiveness of the solution, we produced a series of cubic (Al,Cr)N coatings by sputtering an Al60Cr40 target. Most of the coatings have a stoichiometric composition, smooth surface and a moderate amount of growth defects. Significant improvements through recipe optimisation could be achieved resulting in mechanical properties (hardness, fracture toughness, wear resistance) being equal to and even exceeding those of the benchmark coatings produced by means of conventional sputtering and cathodic arc evaporation. Our results open up great potential of this novel sputtering technique for the coating industry.

Citovat

KLIMASHIN, F. F., J. KLUSOŇ, Martin UČÍK, R. ŽEMLIČKA, M. JÍLEK, A. LÜMKEMANN, J. MICHLER and T. E. J. EDWARDS. High-power-density sputtering of industrial-scale targets: Case study of (Al,Cr)N. Materials and Design. Elsevier, 2024, vol. 237, January, p. 1-12. ISSN 0264-1275. Available from: https://dx.doi.org/10.1016/j.matdes.2023.112553.

@article{2366997,
   author = {Klimashin, F. F. and Klusoň, J. and Učík, Martin and Žemlička, R. and Jílek, M. and Lümkemann, A. and Michler, J. and Edwards, T. E. J.},
   article_number = {January},
   doi = {http://dx.doi.org/10.1016/j.matdes.2023.112553},
   keywords = {Movable magnetron; High-power-density sputtering; AlCrN; Microstructure; Fracture toughness; Cutting performance},
   language = {eng},
   issn = {0264-1275},
   journal = {Materials and Design},
   title = {High-power-density sputtering of industrial-scale targets: Case study of (Al,Cr)N},
   url = {https://www.sciencedirect.com/science/article/pii/S0264127523009693},
   volume = {237},
   year = {2024}
}

TY  - JOUR
ID  - 2366997
AU  - Klimashin, F. F. - Klusoň, J. - Učík, Martin - Žemlička, R. - Jílek, M. - Lümkemann, A. - Michler, J. - Edwards, T. E. J.
PY  - 2024
TI  - High-power-density sputtering of industrial-scale targets: Case study of (Al,Cr)N
JF  - Materials and Design
VL  - 237
IS  - January
SP  - 1-12
EP  - 1-12
PB  - Elsevier
SN  - 02641275
KW  - Movable magnetron
KW  - High-power-density sputtering
KW  - AlCrN
KW  - Microstructure
KW  - Fracture toughness
KW  - Cutting performance
UR  - https://www.sciencedirect.com/science/article/pii/S0264127523009693
N2  - Large-scale sputter-deposition of hard protective coatings has not been prevalent as the large dimensions of the industrial targets posed an enormous technological challenge: only relatively low power (and plasma) densities could be achieved, resulting ultimately in poor performance of such coatings. Here, we introduce a novel sputtering technology allowing to reach high power densities for industrial tubular targets. This is realised on the principle of a longitudinal movement of a reduced-size magnetron inside the target. In doing so, peak power densities of 840 W/cm2 have been achieved for the overall power of 25 kW and the target dimensions of Ø110 × 510 mm. To demonstrate the effectiveness of the solution, we produced a series of cubic (Al,Cr)N coatings by sputtering an Al60Cr40 target. Most of the coatings have a stoichiometric composition, smooth surface and a moderate amount of growth defects. Significant improvements through recipe optimisation could be achieved resulting in mechanical properties (hardness, fracture toughness, wear resistance) being equal to and even exceeding those of the benchmark coatings produced by means of conventional sputtering and cathodic arc evaporation. Our results open up great potential of this novel sputtering technique for the coating industry.
ER  -

KLIMASHIN, F. F., J. KLUSOŇ, Martin UČÍK, R. ŽEMLIČKA, M. JÍLEK, A. LÜMKEMANN, J. MICHLER and T. E. J. EDWARDS. High-power-density sputtering of industrial-scale targets: Case study of (Al,Cr)N. \textit{Materials and Design}. Elsevier, 2024, vol.~237, January, p.~1-12. ISSN~0264-1275. Available from: https://dx.doi.org/10.1016/j.matdes.2023.112553.

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