Polymerization mechanisms of hexamethyldisiloxane in
low-pressure plasmas involving complex geometries

J 2024

Polymerization mechanisms of hexamethyldisiloxane in low-pressure plasmas involving complex geometries

NAVASCUES, Paula, Martina BUCHTELOVA, Lenka ZAJÍČKOVÁ, Patrick RUPPER, Dirk HEGEMANN et. al.

Basic information

Original name

Polymerization mechanisms of hexamethyldisiloxane in low-pressure plasmas involving complex geometries

Authors

NAVASCUES, Paula, Martina BUCHTELOVA, Lenka ZAJÍČKOVÁ (203 Czech Republic, belonging to the institution), Patrick RUPPER and Dirk HEGEMANN

Edition

Applied Surface Science, Elsevier, 2024, 0169-4332

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10300 1.3 Physical sciences

Country of publisher

Netherlands

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

Impact factor

Impact factor: 6.700 in 2022

Organization unit

Faculty of Science

DOI

http://dx.doi.org/10.1016/j.apsusc.2023.158824

UT WoS

001111754700001

Keywords in English

Plasma polymerization; HMDSO; ATR-FTIR; Surface oxidation

Abstract

V originále

Hexamethyldisiloxane (HMDSO) low-pressure plasmas are known for their versatility in the deposition of plasma polymer films (PPFs) with different properties and applications. Although they have been studied for decades, the reaction mechanisms of plasma polymer formation leave open questions, particularly when deposition on 3D materials with complex geometries such as cavities and undercuts is considered. In the present study, two configurations named "cavity" and "undercut" have been selected to study the influence of diffusion of film forming species and surface reactivity in HMDSO plasmas without and with O2 admixture. A varying spatial chemical composition of the plasma polymer deposit along the penetration depth of the studied configurations indicates different sticking probabilities of the film-forming species. Furthermore, although ion-induced effects are usually only considered for direct plasma exposure, the obtained results and additional etching experiments reveal that the contribution of high-energy particles might still be considered underneath small openings. Finally, the relevance of oxidizing chemical reactions at the surface inside the configurations is clarified when O2 is added to the plasma.

Citovat

NAVASCUES, Paula, Martina BUCHTELOVA, Lenka ZAJÍČKOVÁ, Patrick RUPPER and Dirk HEGEMANN. Polymerization mechanisms of hexamethyldisiloxane in low-pressure plasmas involving complex geometries. Applied Surface Science. Elsevier, 2024, vol. 645, February, p. 1-9. ISSN 0169-4332. Available from: https://dx.doi.org/10.1016/j.apsusc.2023.158824.

@article{2368078,
   author = {Navascues, Paula and Buchtelova, Martina and Zajíčková, Lenka and Rupper, Patrick and Hegemann, Dirk},
   article_number = {February},
   doi = {http://dx.doi.org/10.1016/j.apsusc.2023.158824},
   keywords = {Plasma polymerization; HMDSO; ATR-FTIR; Surface oxidation},
   language = {eng},
   issn = {0169-4332},
   journal = {Applied Surface Science},
   title = {Polymerization mechanisms of hexamethyldisiloxane in low-pressure plasmas involving complex geometries},
   url = {https://www.sciencedirect.com/science/article/pii/S0169433223025047},
   volume = {645},
   year = {2024}
}

TY  - JOUR
ID  - 2368078
AU  - Navascues, Paula - Buchtelova, Martina - Zajíčková, Lenka - Rupper, Patrick - Hegemann, Dirk
PY  - 2024
TI  - Polymerization mechanisms of hexamethyldisiloxane in low-pressure plasmas involving complex geometries
JF  - Applied Surface Science
VL  - 645
IS  - February
SP  - 1-9
EP  - 1-9
PB  - Elsevier
SN  - 01694332
KW  - Plasma polymerization
KW  - HMDSO
KW  - ATR-FTIR
KW  - Surface oxidation
UR  - https://www.sciencedirect.com/science/article/pii/S0169433223025047
N2  - Hexamethyldisiloxane (HMDSO) low-pressure plasmas are known for their versatility in the deposition of plasma polymer films (PPFs) with different properties and applications. Although they have been studied for decades, the reaction mechanisms of plasma polymer formation leave open questions, particularly when deposition on 3D materials with complex geometries such as cavities and undercuts is considered. In the present study, two configurations named "cavity" and "undercut" have been selected to study the influence of diffusion of film forming species and surface reactivity in HMDSO plasmas without and with O2 admixture. A varying spatial chemical composition of the plasma polymer deposit along the penetration depth of the studied configurations indicates different sticking probabilities of the film-forming species. Furthermore, although ion-induced effects are usually only considered for direct plasma exposure, the obtained results and additional etching experiments reveal that the contribution of high-energy particles might still be considered underneath small openings. Finally, the relevance of oxidizing chemical reactions at the surface inside the configurations is clarified when O2 is added to the plasma.
ER  -

NAVASCUES, Paula, Martina BUCHTELOVA, Lenka ZAJÍČKOVÁ, Patrick RUPPER and Dirk HEGEMANN. Polymerization mechanisms of hexamethyldisiloxane in low-pressure plasmas involving complex geometries. \textit{Applied Surface Science}. Elsevier, 2024, vol.~645, February, p.~1-9. ISSN~0169-4332. Available from: https://dx.doi.org/10.1016/j.apsusc.2023.158824.

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