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@article{2417346, author = {Hnilica, Jaroslav and Klein, Peter and Učík, Martin and Debnárová, Stanislava and Klusoň, Jan and Vašina, Petr}, article_number = {July 2024}, doi = {http://dx.doi.org/10.1016/j.surfcoat.2024.131028}, keywords = {Titanium; Magnetron sputtering; Industry; HiPIMS; Coatings}, language = {eng}, issn = {0257-8972}, journal = {Surface and Coatings Technology}, title = {On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species}, url = {https://www.sciencedirect.com/science/article/pii/S0257897224006595}, volume = {487}, year = {2024} }
TY - JOUR ID - 2417346 AU - Hnilica, Jaroslav - Klein, Peter - Učík, Martin - Debnárová, Stanislava - Klusoň, Jan - Vašina, Petr PY - 2024 TI - On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species JF - Surface and Coatings Technology VL - 487 IS - July 2024 SP - 1-7 EP - 1-7 PB - Elsevier B.V. SN - 02578972 KW - Titanium KW - Magnetron sputtering KW - Industry KW - HiPIMS KW - Coatings UR - https://www.sciencedirect.com/science/article/pii/S0257897224006595 N2 - In the industry, there is a preference for robust and technologically straightforward solutions that can deliver desired products at reasonable costs. This study introduces a reliable, robust, and cost-effective ion-assisted thin film growth technique called moving focused magnetic field magnetron sputtering. At the core of this technology lies the generation of dense plasma within a small area of the target and the controlled movement of this plasma across the entire target surface. The deposition process, powered by a direct current generator, behaves similarly to high-power impulse magnetron sputtering and yields coatings with properties comparable to those produced by this method. Notably, this study marks the first application of an ion meter to measure the ionized metal flux fraction of sputtered titanium at industrial conditions, revealing values of up to 34% measured at the substrate position. ER -
HNILICA, Jaroslav, Peter KLEIN, Martin UČÍK, Stanislava DEBNÁROVÁ, Jan KLUSOŇ a Petr VAŠINA. On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species. \textit{Surface and Coatings Technology}. Elsevier B.V., 2024, roč.~487, July 2024, s.~1-7. ISSN~0257-8972. Dostupné z: https://dx.doi.org/10.1016/j.surfcoat.2024.131028.
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