On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species

HNILICA, Jaroslav, Peter KLEIN, Martin UČÍK, Stanislava DEBNÁROVÁ, Jan KLUSOŇ and Petr VAŠINA. On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species. Surface and Coatings Technology. Elsevier B.V., 2024, vol. 487, July 2024, p. 1-7. ISSN 0257-8972. Available from: https://dx.doi.org/10.1016/j.surfcoat.2024.131028.

Basic information

• Original name: On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species
• Authors: HNILICA, Jaroslav (203 Czech Republic, guarantor, belonging to the institution), Peter KLEIN (703 Slovakia, belonging to the institution), Martin UČÍK (203 Czech Republic, belonging to the institution), Stanislava DEBNÁROVÁ (703 Slovakia, belonging to the institution), Jan KLUSOŇ and Petr VAŠINA (203 Czech Republic, belonging to the institution).
• Edition: Surface and Coatings Technology, Elsevier B.V. 2024, 0257-8972.

Other information

• Original language: English
• Type of outcome: Article in a journal
• Field of Study: 10300 1.3 Physical sciences
• Country of publisher: Switzerland
• Confidentiality degree: is not subject to a state or trade secret
• WWW: URL
• Impact factor: Impact factor: 5.400 in 2022
• Organization unit: Faculty of Science
• Doi: http://dx.doi.org/10.1016/j.surfcoat.2024.131028
• UT WoS: 001260010200001
• Keywords in English: Titanium; Magnetron sputtering; Industry; HiPIMS; Coatings
• Tags: rivok
• Tags: International impact, Reviewed

Abstract

In the industry, there is a preference for robust and technologically straightforward solutions that can deliver desired products at reasonable costs. This study introduces a reliable, robust, and cost-effective ion-assisted thin film growth technique called moving focused magnetic field magnetron sputtering. At the core of this technology lies the generation of dense plasma within a small area of the target and the controlled movement of this plasma across the entire target surface. The deposition process, powered by a direct current generator, behaves similarly to high-power impulse magnetron sputtering and yields coatings with properties comparable to those produced by this method. Notably, this study marks the first application of an ion meter to measure the ionized metal flux fraction of sputtered titanium at industrial conditions, revealing values of up to 34% measured at the substrate position.

Links

• LM2023039, research and development project: Name: Centrum výzkumu a vývoje plazmatu a nanotechnologických povrchových úprav

Investor: Ministry of Education, Youth and Sports of the CR