On direct-current magnetron sputtering at industrial conditions
with high ionization fraction of sputtered species

J 2024

On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species

HNILICA, Jaroslav, Peter KLEIN, Martin UČÍK, Stanislava DEBNÁROVÁ, Jan KLUSOŇ et. al.

Basic information

Original name

On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species

Authors

HNILICA, Jaroslav (203 Czech Republic, guarantor, belonging to the institution), Peter KLEIN (703 Slovakia, belonging to the institution), Martin UČÍK (203 Czech Republic, belonging to the institution), Stanislava DEBNÁROVÁ (703 Slovakia, belonging to the institution), Jan KLUSOŇ and Petr VAŠINA (203 Czech Republic, belonging to the institution)

Edition

Surface and Coatings Technology, Elsevier B.V. 2024, 0257-8972

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10300 1.3 Physical sciences

Country of publisher

Switzerland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

Impact factor

Impact factor: 5.400 in 2022

Organization unit

Faculty of Science

DOI

http://dx.doi.org/10.1016/j.surfcoat.2024.131028

UT WoS

001260010200001

Keywords in English

Titanium; Magnetron sputtering; Industry; HiPIMS; Coatings

Abstract

V originále

In the industry, there is a preference for robust and technologically straightforward solutions that can deliver desired products at reasonable costs. This study introduces a reliable, robust, and cost-effective ion-assisted thin film growth technique called moving focused magnetic field magnetron sputtering. At the core of this technology lies the generation of dense plasma within a small area of the target and the controlled movement of this plasma across the entire target surface. The deposition process, powered by a direct current generator, behaves similarly to high-power impulse magnetron sputtering and yields coatings with properties comparable to those produced by this method. Notably, this study marks the first application of an ion meter to measure the ionized metal flux fraction of sputtered titanium at industrial conditions, revealing values of up to 34% measured at the substrate position.

Links

LM2023039, research and development project

Name: Centrum výzkumu a vývoje plazmatu a nanotechnologických povrchových úprav

Investor: Ministry of Education, Youth and Sports of the CR

Citovat

HNILICA, Jaroslav, Peter KLEIN, Martin UČÍK, Stanislava DEBNÁROVÁ, Jan KLUSOŇ and Petr VAŠINA. On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species. Surface and Coatings Technology. Elsevier B.V., 2024, vol. 487, July 2024, p. 1-7. ISSN 0257-8972. Available from: https://dx.doi.org/10.1016/j.surfcoat.2024.131028.

@article{2417346,
   author = {Hnilica, Jaroslav and Klein, Peter and Učík, Martin and Debnárová, Stanislava and Klusoň, Jan and Vašina, Petr},
   article_number = {July 2024},
   doi = {http://dx.doi.org/10.1016/j.surfcoat.2024.131028},
   keywords = {Titanium; Magnetron sputtering; Industry; HiPIMS; Coatings},
   language = {eng},
   issn = {0257-8972},
   journal = {Surface and Coatings Technology},
   title = {On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species},
   url = {https://www.sciencedirect.com/science/article/pii/S0257897224006595},
   volume = {487},
   year = {2024}
}

TY  - JOUR
ID  - 2417346
AU  - Hnilica, Jaroslav - Klein, Peter - Učík, Martin - Debnárová, Stanislava - Klusoň, Jan - Vašina, Petr
PY  - 2024
TI  - On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species
JF  - Surface and Coatings Technology
VL  - 487
IS  - July 2024
SP  - 1-7
EP  - 1-7
PB  - Elsevier B.V.
SN  - 02578972
KW  - Titanium
KW  - Magnetron sputtering
KW  - Industry
KW  - HiPIMS
KW  - Coatings
UR  - https://www.sciencedirect.com/science/article/pii/S0257897224006595
N2  - In the industry, there is a preference for robust and technologically straightforward solutions that can deliver desired products at reasonable costs. This study introduces a reliable, robust, and cost-effective ion-assisted thin film growth technique called moving focused magnetic field magnetron sputtering. At the core of this technology lies the generation of dense plasma within a small area of the target and the controlled movement of this plasma across the entire target surface. The deposition process, powered by a direct current generator, behaves similarly to high-power impulse magnetron sputtering and yields coatings with properties comparable to those produced by this method. Notably, this study marks the first application of an ion meter to measure the ionized metal flux fraction of sputtered titanium at industrial conditions, revealing values of up to 34% measured at the substrate position.
ER  -

HNILICA, Jaroslav, Peter KLEIN, Martin UČÍK, Stanislava DEBNÁROVÁ, Jan KLUSOŇ and Petr VAŠINA. On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species. \textit{Surface and Coatings Technology}. Elsevier B.V., 2024, vol.~487, July 2024, p.~1-7. ISSN~0257-8972. Available from: https://dx.doi.org/10.1016/j.surfcoat.2024.131028.

Detailed Information on Publication Record