Other formats:
BibTeX
LaTeX
RIS
@article{2420037, author = {Klein, Peter and Hnilica, Jaroslav and Sochora, Vjačeslav and Souček, Pavel and Fekete, Matej and Vašina, Petr}, article_number = {August 2024}, doi = {http://dx.doi.org/10.1016/j.surfcoat.2024.131142}, keywords = {Titanium; Magnetron sputtering; Industry; LAD; Coatings; IPVD; HiPIMS}, language = {eng}, issn = {0257-8972}, journal = {Surface and Coatings Technology}, title = {Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering}, url = {https://www.sciencedirect.com/science/article/pii/S0257897224007734?via%3Dihub}, volume = {489}, year = {2024} }
TY - JOUR ID - 2420037 AU - Klein, Peter - Hnilica, Jaroslav - Sochora, Vjačeslav - Souček, Pavel - Fekete, Matej - Vašina, Petr PY - 2024 TI - Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering JF - Surface and Coatings Technology VL - 489 IS - August 2024 SP - 1-7 EP - 1-7 PB - Elsevier B.V. SN - 02578972 KW - Titanium KW - Magnetron sputtering KW - Industry KW - LAD KW - Coatings KW - IPVD KW - HiPIMS UR - https://www.sciencedirect.com/science/article/pii/S0257897224007734?via%3Dihub N2 - In industrial magnetron sputtering processes, large DC-driven cathodes are commonly employed. This work reports on industrially compatible technology, which allows for the increase in ionized metal flux fraction on the substrate in a controlled manner without sacrificing the deposition rate. From the long arc cathode positioned on the one-hand side of the magnetron cathode, electrons are drawn towards the anode on the other side. This arrangement induces a large volume secondary discharge that extends along the entire length of the magnetron cathode, effectively ionizing sputtered species as they traverse this discharge towards the substrate. With this setup, while sputtering titanium in an argon atmosphere under industrial conditions, up to 28% of ionized metal flux fraction was achieved on the substrate position. This technology significantly improves the quality of the deposited coating, including hardness, Young’s modulus, roughness and fracture resistance, as shown in the TiN case study. ER -
KLEIN, Peter, Jaroslav HNILICA, Vjačeslav SOCHORA, Pavel SOUČEK, Matej FEKETE and Petr VAŠINA. Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering. \textit{Surface and Coatings Technology}. Elsevier B.V., 2024, vol.~489, August 2024, p.~1-7. ISSN~0257-8972. Available from: https://dx.doi.org/10.1016/j.surfcoat.2024.131142.
|