Enhancement of ionized metal flux fraction without compromising
deposition rate in industrial magnetron sputtering

J 2024

Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering

KLEIN, Peter, Jaroslav HNILICA, Vjačeslav SOCHORA, Pavel SOUČEK, Matej FEKETE et. al.

Basic information

Original name

Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering

Authors

KLEIN, Peter (703 Slovakia, belonging to the institution), Jaroslav HNILICA (203 Czech Republic, belonging to the institution), Vjačeslav SOCHORA, Pavel SOUČEK (203 Czech Republic, belonging to the institution), Matej FEKETE (703 Slovakia, belonging to the institution) and Petr VAŠINA (203 Czech Republic, belonging to the institution)

Edition

Surface and Coatings Technology, Elsevier B.V. 2024, 0257-8972

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Switzerland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

Impact factor

Impact factor: 5.400 in 2022

Organization unit

Faculty of Science

DOI

http://dx.doi.org/10.1016/j.surfcoat.2024.131142

UT WoS

001279392200001

Keywords in English

Titanium; Magnetron sputtering; Industry; LAD; Coatings; IPVD; HiPIMS

Abstract

V originále

In industrial magnetron sputtering processes, large DC-driven cathodes are commonly employed. This work reports on industrially compatible technology, which allows for the increase in ionized metal flux fraction on the substrate in a controlled manner without sacrificing the deposition rate. From the long arc cathode positioned on the one-hand side of the magnetron cathode, electrons are drawn towards the anode on the other side. This arrangement induces a large volume secondary discharge that extends along the entire length of the magnetron cathode, effectively ionizing sputtered species as they traverse this discharge towards the substrate. With this setup, while sputtering titanium in an argon atmosphere under industrial conditions, up to 28% of ionized metal flux fraction was achieved on the substrate position. This technology significantly improves the quality of the deposited coating, including hardness, Young’s modulus, roughness and fracture resistance, as shown in the TiN case study.

Links

LM2023039, research and development project

Name: Centrum výzkumu a vývoje plazmatu a nanotechnologických povrchových úprav

Investor: Ministry of Education, Youth and Sports of the CR

TN02000069, research and development project

Name: Národní centrum kompetence pro materiály, pokročilé technologie, povlakování a jejich aplikace

Investor: Technology Agency of the Czech Republic, Materials, Advanced Technologies, Coatings and their Applications

Citovat

KLEIN, Peter, Jaroslav HNILICA, Vjačeslav SOCHORA, Pavel SOUČEK, Matej FEKETE and Petr VAŠINA. Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering. Surface and Coatings Technology. Elsevier B.V., 2024, vol. 489, August 2024, p. 1-7. ISSN 0257-8972. Available from: https://dx.doi.org/10.1016/j.surfcoat.2024.131142.

@article{2420037,
   author = {Klein, Peter and Hnilica, Jaroslav and Sochora, Vjačeslav and Souček, Pavel and Fekete, Matej and Vašina, Petr},
   article_number = {August 2024},
   doi = {http://dx.doi.org/10.1016/j.surfcoat.2024.131142},
   keywords = {Titanium; Magnetron sputtering; Industry; LAD; Coatings; IPVD; HiPIMS},
   language = {eng},
   issn = {0257-8972},
   journal = {Surface and Coatings Technology},
   title = {Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering},
   url = {https://www.sciencedirect.com/science/article/pii/S0257897224007734?via%3Dihub},
   volume = {489},
   year = {2024}
}

TY  - JOUR
ID  - 2420037
AU  - Klein, Peter - Hnilica, Jaroslav - Sochora, Vjačeslav - Souček, Pavel - Fekete, Matej - Vašina, Petr
PY  - 2024
TI  - Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering
JF  - Surface and Coatings Technology
VL  - 489
IS  - August 2024
SP  - 1-7
EP  - 1-7
PB  - Elsevier B.V.
SN  - 02578972
KW  - Titanium
KW  - Magnetron sputtering
KW  - Industry
KW  - LAD
KW  - Coatings
KW  - IPVD
KW  - HiPIMS
UR  - https://www.sciencedirect.com/science/article/pii/S0257897224007734?via%3Dihub
N2  - In industrial magnetron sputtering processes, large DC-driven cathodes are commonly employed. This work reports on industrially compatible technology, which allows for the increase in ionized metal flux fraction on the substrate in a controlled manner without sacrificing the deposition rate. From the long arc cathode positioned on the one-hand side of the magnetron cathode, electrons are drawn towards the anode on the other side. This arrangement induces a large volume secondary discharge that extends along the entire length of the magnetron cathode, effectively ionizing sputtered species as they traverse this discharge towards the substrate. With this setup, while sputtering titanium in an argon atmosphere under industrial conditions, up to 28% of ionized metal flux fraction was achieved on the substrate position. This technology significantly improves the quality of the deposited coating, including hardness, Young’s modulus, roughness and fracture resistance, as shown in the TiN case study.
ER  -

KLEIN, Peter, Jaroslav HNILICA, Vjačeslav SOCHORA, Pavel SOUČEK, Matej FEKETE and Petr VAŠINA. Enhancement of ionized metal flux fraction without compromising deposition rate in industrial magnetron sputtering. \textit{Surface and Coatings Technology}. Elsevier B.V., 2024, vol.~489, August 2024, p.~1-7. ISSN~0257-8972. Available from: https://dx.doi.org/10.1016/j.surfcoat.2024.131142.

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