J 2000

Analysis of Slightly Rough Thin Films by Optical Methods and AFM

FRANTA, Daniel, Ivan OHLÍDAL and Petr KLAPETEK

Basic information

Original name

Analysis of Slightly Rough Thin Films by Optical Methods and AFM

Authors

FRANTA, Daniel (203 Czech Republic, guarantor), Ivan OHLÍDAL (203 Czech Republic) and Petr KLAPETEK (203 Czech Republic)

Edition

Mikrochim. Acta, Wien, Springer-Verlag, 2000, 0026-3672

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10302 Condensed matter physics

Country of publisher

Austria

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

Impact factor

Impact factor: 1.303

RIV identification code

RIV/00216224:14310/00:00002233

Organization unit

Faculty of Science

UT WoS

000086810800042

Keywords in English

Spectroscopic Ellipsometry; Spectroscopic Reflectometry; Atomic Force Microscopy; Rough Thin Films

Tags

Změněno: 22/12/2003 00:23, Mgr. Daniel Franta, Ph.D.

Abstract

V originále

In this paper the analysis of a family of rough silicon single crystal surfaces covered with native oxide layers is performed using a combined optical method based on a multisample treatment of the experimental data obtained using variable angle of spectroscopic ellipsometry and near normal spectroscopic reflectometry. Within this analysis the values of the thicknesses of the native oxide layers are determined together with the values of statistical parameters of roughness, i.e. with the rms values of the heights and the values of the autocorrelation lengths, for all the samples studied. For interpreting experimental data the perturbation Rayleigh-Rice theory and scalar diffraction theory are employed. By means of the results of the analysis achieved using both the theories limitations of the validity of these theories is discussed. The correctness of the values of the statistical parameters determined using the optical method is verified using AFM measurements.

Links

GA202/98/0988, research and development project
Name: Charakterizace vrstevnatých systémů s náhodně drsnými rozhraními pomocí optických a rtg metod
Investor: Czech Science Foundation, Characterization of multilayer systems with randomly rough boundaries by means of optical and X - ray methods
GV106/96/K245, research and development project
Name: Tvrdé a supertvrdé povlaky vytvořené nekonvenčními plazmovými procesy
Investor: Czech Science Foundation, Hard and superhard coatings prepared by unconventional plasma processes
VS96084, research and development project
Name: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze
Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague