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@article{329651, author = {Ohlídal, Ivan and Franta, Daniel}, article_location = {Bratislava}, article_number = {4}, language = {eng}, issn = {0323-0465}, journal = {Acta physica slovaca}, title = {Matrix formalism for imperfect thin films}, url = {http://hydra.physics.muni.cz/~franta/bib/APS50_489.html}, volume = {50}, year = {2000} }
TY - JOUR ID - 329651 AU - Ohlídal, Ivan - Franta, Daniel PY - 2000 TI - Matrix formalism for imperfect thin films JF - Acta physica slovaca VL - 50 IS - 4 SP - 489 EP - 489 PB - Institute of Physics, SAS SN - 03230465 UR - http://hydra.physics.muni.cz/~franta/bib/APS50_489.html N2 - In this review paper a uniform matrix formalism enabling us to include the important defects of thin film systems into the formulae for their optical quantities is presented. The following defects are discussed: roughness of the boundaries; inhomogeneity represented by profiles of the refractive indices; transition interface layer and volume inhomogeneity. It is shown that this formalism is relatively very efficient. Thus fact is demonstrated using a theoretical example representing a complicated thin film system exhibiting defects. ER -
OHLÍDAL, Ivan and Daniel FRANTA. Matrix formalism for imperfect thin films. \textit{Acta physica slovaca}. Bratislava: Institute of Physics, SAS, 2000, vol.~50, No~4, p.~489-500. ISSN~0323-0465.
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