J 2000

Matrix formalism for imperfect thin films

OHLÍDAL, Ivan and Daniel FRANTA

Basic information

Original name

Matrix formalism for imperfect thin films

Authors

OHLÍDAL, Ivan (203 Czech Republic, guarantor) and Daniel FRANTA (203 Czech Republic)

Edition

Acta physica slovaca, Bratislava, Institute of Physics, SAS, 2000, 0323-0465

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10302 Condensed matter physics

Country of publisher

Slovakia

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

Impact factor

Impact factor: 0.465

RIV identification code

RIV/00216224:14310/00:00002316

Organization unit

Faculty of Science

UT WoS

000088911400009
Změněno: 22/12/2003 00:46, Mgr. Daniel Franta, Ph.D.

Abstract

V originále

In this review paper a uniform matrix formalism enabling us to include the important defects of thin film systems into the formulae for their optical quantities is presented. The following defects are discussed: roughness of the boundaries; inhomogeneity represented by profiles of the refractive indices; transition interface layer and volume inhomogeneity. It is shown that this formalism is relatively very efficient. Thus fact is demonstrated using a theoretical example representing a complicated thin film system exhibiting defects.

Links

GA202/98/0988, research and development project
Name: Charakterizace vrstevnatých systémů s náhodně drsnými rozhraními pomocí optických a rtg metod
Investor: Czech Science Foundation, Characterization of multilayer systems with randomly rough boundaries by means of optical and X - ray methods
GV106/96/K245, research and development project
Name: Tvrdé a supertvrdé povlaky vytvořené nekonvenčními plazmovými procesy
Investor: Czech Science Foundation, Hard and superhard coatings prepared by unconventional plasma processes
VS96084, research and development project
Name: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze
Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague