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@article{329651,
author = {Ohlídal, Ivan and Franta, Daniel},
article_location = {Bratislava},
article_number = {4},
language = {eng},
issn = {0323-0465},
journal = {Acta physica slovaca},
title = {Matrix formalism for imperfect thin films},
url = {http://hydra.physics.muni.cz/~franta/bib/APS50_489.html},
volume = {50},
year = {2000}
}
TY - JOUR
ID - 329651
AU - Ohlídal, Ivan - Franta, Daniel
PY - 2000
TI - Matrix formalism for imperfect thin films
JF - Acta physica slovaca
VL - 50
IS - 4
SP - 489
EP - 489
PB - Institute of Physics, SAS
SN - 03230465
UR - http://hydra.physics.muni.cz/~franta/bib/APS50_489.html
N2 - In this review paper a uniform matrix formalism enabling us to include the important defects of thin film systems into the formulae for their optical quantities is presented. The following defects are discussed: roughness of the boundaries; inhomogeneity represented by profiles of the refractive indices; transition interface layer and volume inhomogeneity. It is shown that this formalism is relatively very efficient. Thus fact is demonstrated using a theoretical example representing a complicated thin film system exhibiting defects.
ER -
OHLÍDAL, Ivan and Daniel FRANTA. Matrix formalism for imperfect thin films. \textit{Acta physica slovaca}. Bratislava: Institute of Physics, SAS, 2000, vol.~50, No~4, p.~489-500. ISSN~0323-0465.
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