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PAVELKA, Radek, Ivan OHLÍDAL, Jan HLÁVKA, Daniel FRANTA and Helmut SITTER. Optical characterization of thin films with randomly rough boundaries using the photovoltage method. Thin Solid Films. UK Oxford: Elsevier science, 2000, vol. 366, No 1, p. 43-50. ISSN 0040-6090.
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Basic information
Original name Optical characterization of thin films with randomly rough boundaries using the photovoltage method
Authors PAVELKA, Radek (203 Czech Republic), Ivan OHLÍDAL (203 Czech Republic, guarantor), Jan HLÁVKA (203 Czech Republic), Daniel FRANTA (203 Czech Republic) and Helmut SITTER.
Edition Thin Solid Films, UK Oxford, Elsevier science, 2000, 0040-6090.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10302 Condensed matter physics
Country of publisher United Kingdom of Great Britain and Northern Ireland
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 1.160
RIV identification code RIV/00216224:14310/00:00002318
Organization unit Faculty of Science
UT WoS 000087078800009
Keywords in English Photovoltage; Optical properties; Ellipsometry; Reflection spectroscopy
Tags ellipsometry, Optical properties, Photovoltage, Reflection spectroscopy
Changed by Changed by: Mgr. Daniel Franta, Ph.D., učo 2000. Changed: 22/12/2003 01:01.
Abstract
In this paper the determination of the values of the optical parameters of thin films exhibiting randomly rough boundaries using a photovoltage method is presented. This photovoltage method is based on measuring the radiant flux passing through the film studied. Theoretical formulae needed for applying the method are derived. The practical utilization of the method is illustrated by means of characterizing a rough SiO2-film on a silicon single crystal. A correctness of the results achieved for this film is confirmed by values of the optical parameters of the SiO2-film determined by a combined method of spectroscopic ellipsometry and spectroscopic reflectometry. It will also be shown that the photovoltage method enables us to determine the values of the optical parameters of the rough thin films with the randomly rough boundaries in a simpler way than the standard optical methods.
Links
GA202/98/0988, research and development projectName: Charakterizace vrstevnatých systémů s náhodně drsnými rozhraními pomocí optických a rtg metod
Investor: Czech Science Foundation, Characterization of multilayer systems with randomly rough boundaries by means of optical and X - ray methods
VS96084, research and development projectName: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze
Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague
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