Optical characterization of thin films with randomly rough
boundaries using the photovoltage method

J 2000

Optical characterization of thin films with randomly rough boundaries using the photovoltage method

PAVELKA, Radek, Ivan OHLÍDAL, Jan HLÁVKA, Daniel FRANTA, Helmut SITTER et. al.

Basic information

Original name

Optical characterization of thin films with randomly rough boundaries using the photovoltage method

Authors

PAVELKA, Radek (203 Czech Republic), Ivan OHLÍDAL (203 Czech Republic, guarantor), Jan HLÁVKA (203 Czech Republic), Daniel FRANTA (203 Czech Republic) and Helmut SITTER

Edition

Thin Solid Films, UK Oxford, Elsevier science, 2000, 0040-6090

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10302 Condensed matter physics

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

Impact factor

Impact factor: 1.160

RIV identification code

RIV/00216224:14310/00:00002318

Organization unit

Faculty of Science

UT WoS

000087078800009

Keywords in English

Photovoltage; Optical properties; Ellipsometry; Reflection spectroscopy

Abstract

V originále

In this paper the determination of the values of the optical parameters of thin films exhibiting randomly rough boundaries using a photovoltage method is presented. This photovoltage method is based on measuring the radiant flux passing through the film studied. Theoretical formulae needed for applying the method are derived. The practical utilization of the method is illustrated by means of characterizing a rough SiO2-film on a silicon single crystal. A correctness of the results achieved for this film is confirmed by values of the optical parameters of the SiO2-film determined by a combined method of spectroscopic ellipsometry and spectroscopic reflectometry. It will also be shown that the photovoltage method enables us to determine the values of the optical parameters of the rough thin films with the randomly rough boundaries in a simpler way than the standard optical methods.

Links

GA202/98/0988, research and development project

Name: Charakterizace vrstevnatých systémů s náhodně drsnými rozhraními pomocí optických a rtg metod

Investor: Czech Science Foundation, Characterization of multilayer systems with randomly rough boundaries by means of optical and X - ray methods

VS96084, research and development project

Name: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze

Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague

Citovat

PAVELKA, Radek, Ivan OHLÍDAL, Jan HLÁVKA, Daniel FRANTA and Helmut SITTER. Optical characterization of thin films with randomly rough boundaries using the photovoltage method. Thin Solid Films. UK Oxford: Elsevier science, 2000, vol. 366, No 1, p. 43-50. ISSN 0040-6090.

@article{329691,
   author = {Pavelka, Radek and Ohlídal, Ivan and Hlávka, Jan and Franta, Daniel and Sitter, Helmut},
   article_location = {UK Oxford},
   article_number = {1},
   keywords = {Photovoltage; Optical properties; Ellipsometry; Reflection spectroscopy},
   language = {eng},
   issn = {0040-6090},
   journal = {Thin Solid Films},
   title = {Optical characterization of thin films with randomly rough boundaries using the photovoltage method},
   url = {http://hydra.physics.muni.cz/~franta/bib/TSF366_43.html},
   volume = {366},
   year = {2000}
}

TY  - JOUR
ID  - 329691
AU  - Pavelka, Radek - Ohlídal, Ivan - Hlávka, Jan - Franta, Daniel - Sitter, Helmut
PY  - 2000
TI  - Optical characterization of thin films with randomly rough boundaries using the photovoltage method
JF  - Thin Solid Films
VL  - 366
IS  - 1
SP  - 43-50
EP  - 43-50
PB  - Elsevier science
SN  - 00406090
KW  - Photovoltage
KW  - Optical properties
KW  - Ellipsometry
KW  - Reflection spectroscopy
UR  - http://hydra.physics.muni.cz/~franta/bib/TSF366_43.html
N2  - In this paper the determination of the values of the optical parameters of thin films exhibiting randomly rough boundaries using a photovoltage method is presented. This photovoltage method is based on measuring the radiant flux passing through the film studied. Theoretical formulae needed for applying the method are derived. The practical utilization of the method is illustrated by means of characterizing a rough SiO2-film on a silicon single crystal. A correctness of the results achieved for this film is confirmed by values of the optical parameters of the SiO2-film determined by a combined method of spectroscopic ellipsometry and spectroscopic reflectometry. It will also be shown that the photovoltage method enables us to determine the values of the optical parameters of the rough thin films with the randomly rough boundaries in a simpler way than the standard optical methods.
ER  -

PAVELKA, Radek, Ivan OHLÍDAL, Jan HLÁVKA, Daniel FRANTA and Helmut SITTER. Optical characterization of thin films with randomly rough boundaries using the photovoltage method. \textit{Thin Solid Films}. UK Oxford: Elsevier science, 2000, vol.~366, No~1, p.~43-50. ISSN~0040-6090.

Detailed Information on Publication Record