Detailed Information on Publication Record
2000
Deposition of nanocomposite CNx/SiO films in inductively coupled r.f. discharge
ELIÁŠ, Marek, Lenka ZAJÍČKOVÁ, Vilma BURŠÍKOVÁ, Jan JANČA, Michal LORENC et. al.Basic information
Original name
Deposition of nanocomposite CNx/SiO films in inductively coupled r.f. discharge
Authors
ELIÁŠ, Marek (203 Czech Republic, guarantor), Lenka ZAJÍČKOVÁ (203 Czech Republic), Vilma BURŠÍKOVÁ (203 Czech Republic), Jan JANČA (203 Czech Republic) and Michal LORENC (203 Czech Republic)
Edition
Diamond and Related Materials, New York, Elsevier Science S.A. 2000, 0925-9635
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10305 Fluids and plasma physics
Country of publisher
United States of America
Confidentiality degree
není předmětem státního či obchodního tajemství
Impact factor
Impact factor: 1.591
RIV identification code
RIV/00216224:14310/00:00002461
Organization unit
Faculty of Science
Keywords in English
Carbon; Ellipsometry; Nitrides; Mechanical properties
Tags
International impact, Reviewed
Změněno: 17/7/2007 17:40, doc. Mgr. Lenka Zajíčková, Ph.D.
Abstract
V originále
Nanocomposite CNx/SiO thin films
Links
GV106/96/K245, research and development project |
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ME 301, research and development project |
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ME 367, research and development project |
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MSM 143100003, plan (intention) |
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OC 527.20, research and development project |
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VS96084, research and development project |
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