Reduction of ATP precursors in capacvitive RF discharge plasma reactor

BROŽEK, V., V. DUFEK, Jan JANČA and L. LAPČÍK. Reduction of ATP precursors in capacvitive RF discharge plasma reactor (Reduction of ATP precursors in capacitive RF discharge plasma reactor). In ŠARMAN, L. 14th International Congress, CHISA 2000, Prague, August 2000. Praha: Czech Society of Chemical Engineering, 2000, p. 139. J3.5. ISBN 80-86059-30-8.

Basic information

Original name

Reduction of ATP precursors in capacvitive RF discharge plasma reactor

Authors

BROŽEK, V., V. DUFEK, Jan JANČA and L. LAPČÍK

Edition

Praha, 14th International Congress, CHISA 2000, Prague, August 2000, p. 139-139, J3.5, 2000

Publisher

Czech Society of Chemical Engineering

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Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Czech Republic

Confidentiality degree

není předmětem státního či obchodního tajemství

RIV identification code

RIV/00216224:14310/00:00002474

Organization unit

Faculty of Science

ISBN

80-86059-30-8

Keywords in English

reduction; tungsten trioxide; ammoniumparatungstate; capacitive coupled; plasma

Tags

ammoniumparatungstate, capacitive coupled, plasma, reduction, tungsten trioxide

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Abstract

V originále

The production of tungsten powder is based on precursors which in the first phase of thermic decomposition pass to tungsten trioxide. The subsequent reduction by hydrogen affects the morphology as well as granulometry of the tungsten produced. The contribution deals with the utilisation of plasmachemical decomposition and the activation of ammoniumparatungstate (APT) products in capacitively excited hydrogen plasma.

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Links

MSM 143100003, plan (intention)	Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
OC 527.20, research and development project	Name: Plazmochemické depozice a plazmochemické opracování povrchu pevných substrátů Investor: Ministry of Education, Youth and Sports of the CR, Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate
VS96084, research and development project	Name: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague