Reduction of ATP precursors in capacvitive RF discharge plasma reactor

BROŽEK, V., V. DUFEK, Jan JANČA and L. LAPČÍK. Reduction of ATP precursors in capacvitive RF discharge plasma reactor (Reduction of ATP precursors in capacitive RF discharge plasma reactor). In ŠARMAN, L. 14th International Congress, CHISA 2000, Prague, August 2000. Praha: Czech Society of Chemical Engineering, 2000, p. 139. J3.5. ISBN 80-86059-30-8.

Basic information

• Original name: Reduction of ATP precursors in capacvitive RF discharge plasma reactor
• Authors: BROŽEK, V., V. DUFEK, Jan JANČA and L. LAPČÍK.
• Edition: Praha, 14th International Congress, CHISA 2000, Prague, August 2000, p. 139-139, J3.5, 2000.
• Publisher: Czech Society of Chemical Engineering

Other information

• Original language: English
• Type of outcome: Proceedings paper
• Field of Study: 10305 Fluids and plasma physics
• Country of publisher: Czech Republic
• Confidentiality degree: is not subject to a state or trade secret
• RIV identification code: RIV/00216224:14310/00:00002474
• Organization unit: Faculty of Science
• ISBN: 80-86059-30-8
• Keywords in English: reduction; tungsten trioxide; ammoniumparatungstate; capacitive coupled; plasma
• Tags: ammoniumparatungstate, capacitive coupled, plasma, reduction, tungsten trioxide

Abstract

The production of tungsten powder is based on precursors which in the first phase of thermic decomposition pass to tungsten trioxide. The subsequent reduction by hydrogen affects the morphology as well as granulometry of the tungsten produced. The contribution deals with the utilisation of plasmachemical decomposition and the activation of ammoniumparatungstate (APT) products in capacitively excited hydrogen plasma.

Links

• MSM 143100003, plan (intention): Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates

• OC 527.20, research and development project: Name: Plazmochemické depozice a plazmochemické opracování povrchu pevných substrátů

Investor: Ministry of Education, Youth and Sports of the CR, Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate

• VS96084, research and development project: Name: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze

Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague