OHLÍDAL, Ivan and Daniel FRANTA. Ellipsometry of Thin Film Systems. In Progress in Optics, Vol. 41 (Ed. E. Wolf). 1st ed. Amsterdam: Elsevier. p. 181-282. ISBN 0-444-568-7. 2000.
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Basic information
Original name Ellipsometry of Thin Film Systems
Authors OHLÍDAL, Ivan (203 Czech Republic, guarantor) and Daniel FRANTA (203 Czech Republic).
Edition 1. vyd. Amsterdam, Progress in Optics, Vol. 41 (Ed. E. Wolf), p. 181-282, 102 pp. 2000.
Publisher Elsevier
Other information
Original language English
Type of outcome Chapter(s) of a specialized book
Field of Study 10306 Optics
Country of publisher Netherlands
Confidentiality degree is not subject to a state or trade secret
WWW URL
RIV identification code RIV/00216224:14310/00:00002671
Organization unit Faculty of Science
ISBN 0-444-568-7
UT WoS 000290881300003
Changed by Changed by: Mgr. Daniel Franta, Ph.D., učo 2000. Changed: 22/12/2003 00:43.
Abstract
In this paper, a review of both the important theoretical and experimental results concerning ellipsometry is presented.
Links
GA202/98/0988, research and development projectName: Charakterizace vrstevnatých systémů s náhodně drsnými rozhraními pomocí optických a rtg metod
Investor: Czech Science Foundation, Characterization of multilayer systems with randomly rough boundaries by means of optical and X - ray methods
VS96084, research and development projectName: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze
Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague
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