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@article{346842, author = {Bochníček, Zdeněk and Vávra, Ivo and Holý, Václav}, article_number = {1}, keywords = {thermal stability; mutlilayers; x-ray reflection}, language = {eng}, issn = {1211-5895}, journal = {Bulletin Krystalografické společnosti Materials Structure}, title = {Thermal stability of amorphous Nb/Si multilayers studied by x-ray reflection}, volume = {6}, year = {1999} }
TY - JOUR ID - 346842 AU - Bochníček, Zdeněk - Vávra, Ivo - Holý, Václav PY - 1999 TI - Thermal stability of amorphous Nb/Si multilayers studied by x-ray reflection JF - Bulletin Krystalografické společnosti Materials Structure VL - 6 IS - 1 SP - 57 EP - 57 SN - 12115895 KW - thermal stability KW - mutlilayers KW - x-ray reflection N2 - The thermal stability was studied in temperature range from 150C up to 350C. It has been found, that interdifusion causes the interface shift without lost of interface sharpness. The diffusion model has been suggested that is based on enhanced diffusion of Si into Nb component of the multilayer. ER -
BOCHNÍČEK, Zdeněk, Ivo VÁVRA and Václav HOLÝ. Thermal stability of amorphous Nb/Si multilayers studied by x-ray reflection. \textit{Bulletin Krystalografické společnosti Materials Structure}. 1999, vol.~6, No~1, p.~57. ISSN~1211-5895.
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