BURŠÍKOVÁ, Vilma, Lenka ZAJÍČKOVÁ, Pavel DVOŘÁK, Deepak Prasad SUBEDI and Jan JANČA. Plasma enhanced chemical vapor deposition of silicon incorporated diamond-like carbon films. In Abstracts of Invited Lecturers and Contributed Papers ,XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases. Miskolc - Lillafüred, Hungary: European Physical Society, 2000, p. 408-409. |
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@inproceedings{357856, author = {Buršíková, Vilma and Zajíčková, Lenka and Dvořák, Pavel and Subedi, Deepak Prasad and Janča, Jan}, address = {Miskolc - Lillafüred, Hungary}, booktitle = {Abstracts of Invited Lecturers and Contributed Papers ,XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases}, keywords = {PECVD; Diamond-like Carbon; Protective thin films; Silicon doping;}, language = {eng}, location = {Miskolc - Lillafüred, Hungary}, pages = {408-409}, publisher = {European Physical Society}, title = {Plasma enhanced chemical vapor deposition of silicon incorporated diamond-like carbon films}, year = {2000} }
TY - JOUR ID - 357856 AU - Buršíková, Vilma - Zajíčková, Lenka - Dvořák, Pavel - Subedi, Deepak Prasad - Janča, Jan PY - 2000 TI - Plasma enhanced chemical vapor deposition of silicon incorporated diamond-like carbon films PB - European Physical Society CY - Miskolc - Lillafüred, Hungary KW - PECVD KW - Diamond-like Carbon KW - Protective thin films KW - Silicon doping; N2 - Deposition of diamond like films with an incorporation of silicon by plasma enhanced CVD technique from mixture of methane, argon and hexamethyldisiloxane (HMDSO). Study of the influence of the percentage of HMDSO in the mixture on film properties. ER -
BURŠÍKOVÁ, Vilma, Lenka ZAJÍČKOVÁ, Pavel DVOŘÁK, Deepak Prasad SUBEDI and Jan JANČA. Plasma enhanced chemical vapor deposition of silicon incorporated diamond-like carbon films. In \textit{Abstracts of Invited Lecturers and Contributed Papers ,XVth Europhysics Conference on Atomic and Molecular Physics of Ionized Gases}. Miskolc - Lillafüred, Hungary: European Physical Society, 2000, p.~408-409.
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