| OHLÍDAL, Ivan, Daniel FRANTA, Miloslav OHLÍDAL a Karel NAVRÁTIL. Determination of Thicknesses and Spectral Dependences of Refractive Indices of Non-Absorbing and Weakly Absorbing Thin Films Using the Wavelengths Related to Extrema in Spectral Reflectances. Vacuum. USA: ELSEVIER (PERGAMON), roč. 61, č. 1, s. 285-289. ISSN 0042-207X. 2001. |
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@article{366094,
author = {Ohlídal, Ivan and Franta, Daniel and Ohlídal, Miloslav and Navrátil, Karel},
article_location = {USA},
article_number = {1},
keywords = {Thin films; Spectral reflectance; Optical parameters},
language = {eng},
issn = {0042-207X},
journal = {Vacuum},
title = {Determination of Thicknesses and Spectral Dependences of Refractive Indices of Non-Absorbing and Weakly Absorbing Thin Films Using the Wavelengths Related to Extrema in Spectral Reflectances},
url = {http://hydra.physics.muni.cz/~franta/bib/VAC61_285.html},
volume = {61},
year = {2001}
}
TY - JOUR
ID - 366094
AU - Ohlídal, Ivan - Franta, Daniel - Ohlídal, Miloslav - Navrátil, Karel
PY - 2001
TI - Determination of Thicknesses and Spectral Dependences of Refractive Indices of Non-Absorbing and Weakly Absorbing Thin Films Using the Wavelengths Related to Extrema in Spectral Reflectances
JF - Vacuum
VL - 61
IS - 1
SP - 285-289
EP - 285-289
PB - ELSEVIER (PERGAMON)
SN - 0042207X
KW - Thin films
KW - Spectral reflectance
KW - Optical parameters
UR - http://hydra.physics.muni.cz/~franta/bib/VAC61_285.html
N2 - In this contribution a new efficient modification of the method enabling us to perform the optical characterization of non-absorbing and weakly absorbing thin films without using the absolute values of the reflectances measured will be presented. Namely, this modification is based on determining the values of the wavelengths corresponding to the points of touching the spectral dependences of the reflectances of the studied films measured for several angles of incidence with the envelopes of maxima and minima of these spectral dependences. By means of combining the explicit formulae containing the wavelengths mentioned and the suitable iteration procedure one can evaluate the values of the thicknesses and spectral dependences of the refractive indices of the films analyzed in both reliable and precise ways. This fact will be demonstrated through the optical characterization of non-absorbing films of silicon dioxide and weakly absorbing films of photoresist placed on silicon single crystal substrates. The results of this characterization will be compared with those achieved using a combined method of variable angle of incidence spectroscopic ellipsometry and near normal incidence spectroscopic reflectometry.
ER -
OHLÍDAL, Ivan, Daniel FRANTA, Miloslav OHLÍDAL a Karel NAVRÁTIL. Determination of Thicknesses and Spectral Dependences of Refractive Indices of Non-Absorbing and Weakly Absorbing Thin Films Using the Wavelengths Related to Extrema in Spectral Reflectances. \textit{Vacuum}. USA: ELSEVIER (PERGAMON), roč.~61, č.~1, s.~285-289. ISSN~0042-207X. 2001.
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