XPS and Ellipsometric Study of DLC/Silicon Interface

ZAJÍČKOVÁ, Lenka, Kateřina VELTRUSKÁ, Nataliya TSUD and Daniel FRANTA. XPS and Ellipsometric Study of DLC/Silicon Interface. Vacuum. USA: ELSEVIER (PERGAMON), 2001, vol. 61, 2-4, p. 269-273. ISSN 0042-207X.

Basic information

• Original name: XPS and Ellipsometric Study of DLC/Silicon Interface
• Authors: ZAJÍČKOVÁ, Lenka (203 Czech Republic, guarantor), Kateřina VELTRUSKÁ (203 Czech Republic), Nataliya TSUD and Daniel FRANTA (203 Czech Republic).
• Edition: Vacuum, USA, ELSEVIER (PERGAMON), 2001, 0042-207X.

Other information

• Original language: English
• Type of outcome: Article in a journal
• Field of Study: 10305 Fluids and plasma physics
• Country of publisher: United States of America
• Confidentiality degree: is not subject to a state or trade secret
• WWW: URL
• Impact factor: Impact factor: 0.541
• RIV identification code: RIV/00216224:14310/01:00004313
• Organization unit: Faculty of Science
• UT WoS: 000168796500032
• Keywords in English: DLC films; XPS; Ellipsometry; Interface
• Tags: DLC films, ellipsometry, interface, XPS
• Tags: International impact, Reviewed

Abstract

Diamond-like carbon (DLC) films were prepared by plasma enhanced CVD from the mixture of methane and argon on silicon substrates. Films were characterized by multi-sample modification of variable angle spectroscopic ellipsometry. The ellipsometry showed that there is a transition interlayer between the DLC film and the silicon substrate that cannot be attributed to a thin silicon dioxide layer but rather to amorphous silicon and/or modified oxide layer. TRIM calculations revealed that argon or carbon ions could not produce a significant layer of amorphous silicon because the depth of target atom displacements is bellow the thickness of a native oxide layer. The chemical composition of a DLC film profile including a DLC/silicon interface was studied by X-ray photoelectron spectroscopy (XPS) coupled with an argon sputtering of the 34 nm thick DLC film. The DLC/silicon interface composed from less than 6 % of oxygen and gradually decreasing and increasing carbon and silicon percentage, respectively.

Links

• GA202/00/P037, research and development project: Name: Plazmová depozice ochranných vrstev: charakterizace připravených vrstev a diagnostika užitého reaktivního plazmatu

Investor: Czech Science Foundation, Plasma deposition of protective coatings: characterisation of prepared films and diagnostics of reactive plasmas used

• GA202/98/0988, research and development project: Name: Charakterizace vrstevnatých systémů s náhodně drsnými rozhraními pomocí optických a rtg metod

Investor: Czech Science Foundation, Characterization of multilayer systems with randomly rough boundaries by means of optical and X - ray methods

• ME 301, research and development project: Name: Vývoj a průmyslová aplikace nových supertvrdých nanokrystalických kompozitních otěruvzdorných ochranných vrstev

Investor: Ministry of Education, Youth and Sports of the CR, Development and Industrialization of Novel Superhard Nanocrystalline Composite Wear Protective Coatings

• MSM 143100003, plan (intention): Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates

• VS96084, research and development project: Name: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze

Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague