KUDRLE, Vít, Antonín TÁLSKÝ, Petr VAŠINA, Vlastimil KŘÁPEK and Jan JANČA. Atomic nitrogen concentration in afterglow measured by EPR and NO titration methods. In Proceedings of XXVth ICPIG. Nagoya: ICPIG, 2001. p. 231-232.
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Basic information
Original name Atomic nitrogen concentration in afterglow measured by EPR and NO titration methods
Authors KUDRLE, Vít (203 Czech Republic, guarantor), Antonín TÁLSKÝ (203 Czech Republic), Petr VAŠINA (203 Czech Republic), Vlastimil KŘÁPEK (203 Czech Republic) and Jan JANČA (203 Czech Republic).
Edition Nagoya, Proceedings of XXVth ICPIG, p. 231-232, 2001.
Publisher ICPIG
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher Japan
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14330/01:00004332
Organization unit Faculty of Informatics
Tags International impact
Changed by Changed by: prof. Mgr. Vít Kudrle, Ph.D., učo 2560. Changed: 6. 6. 2008 13:30.
Abstract
Atomic nitrogen concentration in afterglow measured by EPR and NO titration methods
Links
GP202/01/P106, research and development projectName: Studium plazmochemických procesů pomocí mikrovlnné a optické spektroskopie
Investor: Czech Science Foundation, Study of plasmachemical processes using microwave and optical spectroscopy
IAA0061001, research and development projectName: Zvukové záznamy českých nářečí (jejich archivace a další využití) 2
MSM 143100003, plan (intention)Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
OC 527.20, research and development projectName: Plazmochemické depozice a plazmochemické opracování povrchu pevných substrátů
Investor: Ministry of Education, Youth and Sports of the CR, Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate
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