Atomic nitrogen concentration in afterglow measured by EPR and NO titration methods
| KUDRLE, Vít, Antonín TÁLSKÝ, Petr VAŠINA, Vlastimil KŘÁPEK and Jan JANČA. Atomic nitrogen concentration in afterglow measured by EPR and NO titration methods. In Proceedings of XXVth ICPIG. Nagoya: ICPIG, 2001. p. 231-232. |
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| Basic information | |
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| Original name | Atomic nitrogen concentration in afterglow measured by EPR and NO titration methods |
| Authors | KUDRLE, Vít (203 Czech Republic, guarantor), Antonín TÁLSKÝ (203 Czech Republic), Petr VAŠINA (203 Czech Republic), Vlastimil KŘÁPEK (203 Czech Republic) and Jan JANČA (203 Czech Republic). |
| Edition | Nagoya, Proceedings of XXVth ICPIG, p. 231-232, 2001. |
| Publisher | ICPIG |
| Other information | |
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| Original language | English |
| Type of outcome | Proceedings paper |
| Field of Study | 10305 Fluids and plasma physics |
| Country of publisher | Japan |
| Confidentiality degree | is not subject to a state or trade secret |
| RIV identification code | RIV/00216224:14330/01:00004332 |
| Organization unit | Faculty of Informatics |
| Tags | International impact |
| Changed by | Changed by: prof. Mgr. Vít Kudrle, Ph.D., učo 2560. Changed: 6. 6. 2008 13:30. |
| Abstract |
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| Atomic nitrogen concentration in afterglow measured by EPR and NO titration methods |
| Links | |
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| GP202/01/P106, research and development project | Name: Studium plazmochemických procesů pomocí mikrovlnné a optické spektroskopie |
| Investor: Czech Science Foundation, Study of plasmachemical processes using microwave and optical spectroscopy | |
| IAA0061001, research and development project | Name: Zvukové záznamy českých nářečí (jejich archivace a další využití) 2 |
| MSM 143100003, plan (intention) | Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek |
| Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates | |
| OC 527.20, research and development project | Name: Plazmochemické depozice a plazmochemické opracování povrchu pevných substrátů |
| Investor: Ministry of Education, Youth and Sports of the CR, Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate | |
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