Atomic nitrogen concentration in afterglow measured by EPR and NO titration methods
KUDRLE, Vít, Antonín TÁLSKÝ, Petr VAŠINA, Vlastimil KŘÁPEK and Jan JANČA. Atomic nitrogen concentration in afterglow measured by EPR and NO titration methods. In Proceedings of XXVth ICPIG. Nagoya: ICPIG, 2001. p. 231-232. |
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Original name | Atomic nitrogen concentration in afterglow measured by EPR and NO titration methods |
Authors | KUDRLE, Vít (203 Czech Republic, guarantor), Antonín TÁLSKÝ (203 Czech Republic), Petr VAŠINA (203 Czech Republic), Vlastimil KŘÁPEK (203 Czech Republic) and Jan JANČA (203 Czech Republic). |
Edition | Nagoya, Proceedings of XXVth ICPIG, p. 231-232, 2001. |
Publisher | ICPIG |
Other information | |
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Original language | English |
Type of outcome | Proceedings paper |
Field of Study | 10305 Fluids and plasma physics |
Country of publisher | Japan |
Confidentiality degree | is not subject to a state or trade secret |
RIV identification code | RIV/00216224:14330/01:00004332 |
Organization unit | Faculty of Informatics |
Tags | International impact |
Changed by | Changed by: prof. Mgr. Vít Kudrle, Ph.D., učo 2560. Changed: 6. 6. 2008 13:30. |
Abstract |
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Atomic nitrogen concentration in afterglow measured by EPR and NO titration methods |
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GP202/01/P106, research and development project | Name: Studium plazmochemických procesů pomocí mikrovlnné a optické spektroskopie |
Investor: Czech Science Foundation, Study of plasmachemical processes using microwave and optical spectroscopy | |
IAA0061001, research and development project | Name: Zvukové záznamy českých nářečí (jejich archivace a další využití) 2 |
MSM 143100003, plan (intention) | Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek |
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates | |
OC 527.20, research and development project | Name: Plazmochemické depozice a plazmochemické opracování povrchu pevných substrátů |
Investor: Ministry of Education, Youth and Sports of the CR, Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate |
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