ZAJÍČKOVÁ, Lenka, Pavel DVOŘÁK, Vilma BURŠÍKOVÁ, Vratislav PEŘINA, Anna MACKOVÁ, Vladislav NAVRÁTIL and Jan JANČA. Plasma Enhanced CVD of DLC:Si(O) Films from Methane/Hexamethyldisiloxane Feeds. In Proceedings of 15th International Symposium on Plasma Chemistry. Orleans (France): GREMI, CNRS/University of Orleans, 2001, p. 133-138.
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Basic information
Original name Plasma Enhanced CVD of DLC:Si(O) Films from Methane/Hexamethyldisiloxane Feeds
Authors ZAJÍČKOVÁ, Lenka (203 Czech Republic, guarantor), Pavel DVOŘÁK (203 Czech Republic), Vilma BURŠÍKOVÁ (203 Czech Republic), Vratislav PEŘINA (203 Czech Republic), Anna MACKOVÁ, Vladislav NAVRÁTIL (203 Czech Republic) and Jan JANČA (203 Czech Republic).
Edition Orleans (France), Proceedings of 15th International Symposium on Plasma Chemistry, p. 133-138, 2001.
Publisher GREMI, CNRS/University of Orleans
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher France
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/01:00004510
Organization unit Faculty of Science
Keywords in English PECVD; Diamod-like carbon; Hardness; Optical emission spectroscopy ; ion density;
Tags Diamod-like carbon, hardness, ion density, optical emission spectroscopy, PECVD
Tags International impact, Reviewed
Changed by Changed by: doc. Mgr. Lenka Zajíčková, Ph.D., učo 1414. Changed: 17/7/2007 17:44.
Abstract
Low pressure deposition of hard carbon films with addition of silicon and oxide was carried out in the mixture of methane and hexamethyldisiloxane (HMDSO). Film properties like deposition rate, hardness and optical constants depended strongly on tbe HMDSO to methane ratio. Moreover, the self bias voltage at the powered electrode, on which the substrates were placed, depended on this ratio too. Therefore, the plasma parameters were studied by OES and capacitavely coupled planar ion flux probe. It was found, that the temperatures as well as positive ion current density depended on the HMDSO to methane flow rate ratio but not on the self bias voltage that was independently changed with an external dc voltage supply.
Links
GA202/00/P037, research and development projectName: Plazmová depozice ochranných vrstev: charakterizace připravených vrstev a diagnostika užitého reaktivního plazmatu
Investor: Czech Science Foundation, Plasma deposition of protective coatings: characterisation of prepared films and diagnostics of reactive plasmas used
ME 301, research and development projectName: Vývoj a průmyslová aplikace nových supertvrdých nanokrystalických kompozitních otěruvzdorných ochranných vrstev
Investor: Ministry of Education, Youth and Sports of the CR, Development and Industrialization of Novel Superhard Nanocrystalline Composite Wear Protective Coatings
ME 367, research and development projectName: Výzkum a vývoj supertvrdých nanokrystalických kompositních materiálů
Investor: Ministry of Education, Youth and Sports of the CR, Research and development and industrializartion of novel super hard nanocrystalline materials
MSM 143100003, plan (intention)Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
OC 527.20, research and development projectName: Plazmochemické depozice a plazmochemické opracování povrchu pevných substrátů
Investor: Ministry of Education, Youth and Sports of the CR, Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate
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