D 2001

Diagnostics of Radio Frequency Oxygen Plasma by Optical Emission Spectroscopy

SUBEDI, Deepak Prasad, Lenka ZAJÍČKOVÁ, Vilma BURŠÍKOVÁ and Jan JANČA

Basic information

Original name

Diagnostics of Radio Frequency Oxygen Plasma by Optical Emission Spectroscopy

Authors

SUBEDI, Deepak Prasad (524 Nepal), Lenka ZAJÍČKOVÁ (203 Czech Republic, guarantor), Vilma BURŠÍKOVÁ (203 Czech Republic) and Jan JANČA (203 Czech Republic)

Edition

1. vyd. Praha, WDS'01 Proceedings of Contributed Papers, p. 400-405, 2001

Publisher

matfyzpress

Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Czech Republic

Confidentiality degree

není předmětem státního či obchodního tajemství

RIV identification code

RIV/00216224:14310/01:00004542

Organization unit

Faculty of Science

ISBN

80-85863-73-1

Keywords in English

rf plasma; emission sectroscopy; rotational temperature; actinometry

Tags

Reviewed
Změněno: 17/7/2007 17:50, doc. Mgr. Lenka Zajíčková, Ph.D.

Abstract

V originále

Low pressure radio-frequency plasma produced in a capacitively coupled planar reactor has been studied by optical emission spectroscopy. Rotational temperature of oxygen molecule has been estimated at pressure 37 Pa and rf power 100-450 W. Concentration of atomic oxygen atom was monitored by actinometry.

Links

GA202/00/P037, research and development project
Name: Plazmová depozice ochranných vrstev: charakterizace připravených vrstev a diagnostika užitého reaktivního plazmatu
Investor: Czech Science Foundation, Plasma deposition of protective coatings: characterisation of prepared films and diagnostics of reactive plasmas used
MSM 143100003, plan (intention)
Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
OC 527.20, research and development project
Name: Plazmochemické depozice a plazmochemické opracování povrchu pevných substrátů
Investor: Ministry of Education, Youth and Sports of the CR, Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate