Optical characterization of DLC:Si films prepared by PECVD

FRANTA, Daniel, Vilma BURŠÍKOVÁ and Lenka ZAJÍČKOVÁ. Optical characterization of DLC:Si films prepared by PECVD. In Proceedings of 13th Symposium on Application of Plasma Processes. Bratislava (Slovakia): Dept. of Plasma Physics & Inst. of Physics, Comenius University Bratislava (Slovakia), 2001, p. 87-88. ISBN 80-223-157.

Basic information

• Original name: Optical characterization of DLC:Si films prepared by PECVD
• Authors: FRANTA, Daniel (203 Czech Republic, guarantor), Vilma BURŠÍKOVÁ (203 Czech Republic) and Lenka ZAJÍČKOVÁ (203 Czech Republic).
• Edition: Bratislava (Slovakia), Proceedings of 13th Symposium on Application of Plasma Processes, p. 87-88, 2 pp. 2001.
• Publisher: Dept. of Plasma Physics & Inst. of Physics, Comenius University Bratislava (Slovakia)

Other information

• Original language: English
• Type of outcome: Proceedings paper
• Field of Study: 10305 Fluids and plasma physics
• Country of publisher: Slovakia
• Confidentiality degree: is not subject to a state or trade secret
• WWW: URL
• RIV identification code: RIV/00216224:14310/01:00004615
• Organization unit: Faculty of Science
• ISBN: 80-223-157
• Tags: International impact

Abstract

Multi-sample modification of variable angle of incidence spectroscopic ellipsometry (VASE) was used to characterize silicon doped diamond like carbon (DLC:Si) films prepared by plasma enhanced chemical vapor deposition (PECVD). These films were prepared on wafers of silicon single crystal in the planar capacitively coupled RF reactor. The gas feed for deposition was a mixture of methane (CH4), hexamethyldisiloxane (HMDSO) and argon (Ar).

Links

• GA202/00/P037, research and development project: Name: Plazmová depozice ochranných vrstev: charakterizace připravených vrstev a diagnostika užitého reaktivního plazmatu

Investor: Czech Science Foundation, Plasma deposition of protective coatings: characterisation of prepared films and diagnostics of reactive plasmas used

• GA202/98/0988, research and development project: Name: Charakterizace vrstevnatých systémů s náhodně drsnými rozhraními pomocí optických a rtg metod

Investor: Czech Science Foundation, Characterization of multilayer systems with randomly rough boundaries by means of optical and X - ray methods

• MSM 143100003, plan (intention): Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates

• OC 527.20, research and development project: Name: Plazmochemické depozice a plazmochemické opracování povrchu pevných substrátů

Investor: Ministry of Education, Youth and Sports of the CR, Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate