D 2001

Optical characterization of DLC:Si films prepared by PECVD

FRANTA, Daniel, Vilma BURŠÍKOVÁ and Lenka ZAJÍČKOVÁ

Basic information

Original name

Optical characterization of DLC:Si films prepared by PECVD

Authors

FRANTA, Daniel (203 Czech Republic, guarantor), Vilma BURŠÍKOVÁ (203 Czech Republic) and Lenka ZAJÍČKOVÁ (203 Czech Republic)

Edition

Bratislava (Slovakia), Proceedings of 13th Symposium on Application of Plasma Processes, p. 87-88, 2 pp. 2001

Publisher

Dept. of Plasma Physics & Inst. of Physics, Comenius University Bratislava (Slovakia)

Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Slovakia

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

RIV identification code

RIV/00216224:14310/01:00004615

Organization unit

Faculty of Science

ISBN

80-223-157

Tags

International impact
Změněno: 17/7/2007 17:45, doc. Mgr. Lenka Zajíčková, Ph.D.

Abstract

V originále

Multi-sample modification of variable angle of incidence spectroscopic ellipsometry (VASE) was used to characterize silicon doped diamond like carbon (DLC:Si) films prepared by plasma enhanced chemical vapor deposition (PECVD). These films were prepared on wafers of silicon single crystal in the planar capacitively coupled RF reactor. The gas feed for deposition was a mixture of methane (CH4), hexamethyldisiloxane (HMDSO) and argon (Ar).

Links

GA202/00/P037, research and development project
Name: Plazmová depozice ochranných vrstev: charakterizace připravených vrstev a diagnostika užitého reaktivního plazmatu
Investor: Czech Science Foundation, Plasma deposition of protective coatings: characterisation of prepared films and diagnostics of reactive plasmas used
GA202/98/0988, research and development project
Name: Charakterizace vrstevnatých systémů s náhodně drsnými rozhraními pomocí optických a rtg metod
Investor: Czech Science Foundation, Characterization of multilayer systems with randomly rough boundaries by means of optical and X - ray methods
MSM 143100003, plan (intention)
Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
OC 527.20, research and development project
Name: Plazmochemické depozice a plazmochemické opracování povrchu pevných substrátů
Investor: Ministry of Education, Youth and Sports of the CR, Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate