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OHLÍDAL, Ivan, Daniel FRANTA, Miloslav OHLÍDAL and Karel NAVRÁTIL. Optical characterization of nonabsorbing and weakly absorbing thin films with the wavelengths related to extrema in spectral reflectances. Applied Optics. USA: Optical Society of America, 2001, vol. 40, No 31, p. 5711-5717. ISSN 0003-6935.
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Basic information
Original name Optical characterization of nonabsorbing and weakly absorbing thin films with the wavelengths related to extrema in spectral reflectances
Authors OHLÍDAL, Ivan (203 Czech Republic, guarantor), Daniel FRANTA (203 Czech Republic), Miloslav OHLÍDAL (203 Czech Republic) and Karel NAVRÁTIL (203 Czech Republic).
Edition Applied Optics, USA, Optical Society of America, 2001, 0003-6935.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10306 Optics
Country of publisher United States of America
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 1.459
RIV identification code RIV/00216224:14310/01:00004763
Organization unit Faculty of Science
UT WoS 000171853400019
Keywords in English REFLECTION; CONSTANTS; THICKNESS; SILICON; SYSTEM
Tags CONSTANTS, reflection, Silicon, system, THICKNESS
Changed by Changed by: Mgr. Daniel Franta, Ph.D., učo 2000. Changed: 25/12/2003 00:46.
Abstract
In this contribution a new efficient modification of a method that enables us to perform the optical characterization of nonabsorbing and weakly absorbing thin films without using the absolute values of the reflectances measured is presented. Namely, this modification is based on determining the values of the wavelengths corresponding to touching the spectral dependences of the reflectances of the studied films measured for several angles of incidence with the envelopes of maxima and minima of these spectral dependences. By means of combining the explicit formulas containing the wavelengths mentioned and the suitable iteration procedure one can evaluate the values of the thicknesses and spectral dependences of the refractive indices of the films analyzed in reliable and precise ways.
Links
GA202/98/0988, research and development projectName: Charakterizace vrstevnatých systémů s náhodně drsnými rozhraními pomocí optických a rtg metod
Investor: Czech Science Foundation, Characterization of multilayer systems with randomly rough boundaries by means of optical and X - ray methods
GV106/96/K245, research and development projectName: Tvrdé a supertvrdé povlaky vytvořené nekonvenčními plazmovými procesy
Investor: Czech Science Foundation, Hard and superhard coatings prepared by unconventional plasma processes
VS96084, research and development projectName: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze
Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague
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