J 2001

Optical characterization of nonabsorbing and weakly absorbing thin films with the wavelengths related to extrema in spectral reflectances

OHLÍDAL, Ivan, Daniel FRANTA, Miloslav OHLÍDAL and Karel NAVRÁTIL

Basic information

Original name

Optical characterization of nonabsorbing and weakly absorbing thin films with the wavelengths related to extrema in spectral reflectances

Authors

OHLÍDAL, Ivan (203 Czech Republic, guarantor), Daniel FRANTA (203 Czech Republic), Miloslav OHLÍDAL (203 Czech Republic) and Karel NAVRÁTIL (203 Czech Republic)

Edition

Applied Optics, USA, Optical Society of America, 2001, 0003-6935

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10306 Optics

Country of publisher

United States of America

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

Impact factor

Impact factor: 1.459

RIV identification code

RIV/00216224:14310/01:00004763

Organization unit

Faculty of Science

UT WoS

000171853400019

Keywords in English

REFLECTION; CONSTANTS; THICKNESS; SILICON; SYSTEM
Změněno: 25/12/2003 00:46, Mgr. Daniel Franta, Ph.D.

Abstract

V originále

In this contribution a new efficient modification of a method that enables us to perform the optical characterization of nonabsorbing and weakly absorbing thin films without using the absolute values of the reflectances measured is presented. Namely, this modification is based on determining the values of the wavelengths corresponding to touching the spectral dependences of the reflectances of the studied films measured for several angles of incidence with the envelopes of maxima and minima of these spectral dependences. By means of combining the explicit formulas containing the wavelengths mentioned and the suitable iteration procedure one can evaluate the values of the thicknesses and spectral dependences of the refractive indices of the films analyzed in reliable and precise ways.

Links

GA202/98/0988, research and development project
Name: Charakterizace vrstevnatých systémů s náhodně drsnými rozhraními pomocí optických a rtg metod
Investor: Czech Science Foundation, Characterization of multilayer systems with randomly rough boundaries by means of optical and X - ray methods
GV106/96/K245, research and development project
Name: Tvrdé a supertvrdé povlaky vytvořené nekonvenčními plazmovými procesy
Investor: Czech Science Foundation, Hard and superhard coatings prepared by unconventional plasma processes
VS96084, research and development project
Name: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze
Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague