Thin Films Deposited from Ar/C2H2 by Pulsed RF PECVD: Deposition Profiles in Tubular Plug-Flow Reactor

VALTR, Miroslav, Lenka ZAJÍČKOVÁ and Siegmar RUDAKOWSKI. Thin Films Deposited from Ar/C2H2 by Pulsed RF PECVD: Deposition Profiles in Tubular Plug-Flow Reactor. In JUNIORMAT 01. 1. vyd. Brno: ÚMI VUT FSI v Brně ve spolupráci s Českou společností pro nové materiály a technologie, 2001, p. 277-278. ISBN 80-214-1885-0.

Basic information

Original name

Thin Films Deposited from Ar/C2H2 by Pulsed RF PECVD: Deposition Profiles in Tubular Plug-Flow Reactor

Authors

VALTR, Miroslav (203 Czech Republic), Lenka ZAJÍČKOVÁ (203 Czech Republic, guarantor) and Siegmar RUDAKOWSKI

Edition

1. vyd. Brno, JUNIORMAT 01, p. 277-278, 2001

Publisher

ÚMI VUT FSI v Brně ve spolupráci s Českou společností pro nové materiály a technologie

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Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Czech Republic

Confidentiality degree

není předmětem státního či obchodního tajemství

RIV identification code

RIV/00216224:14310/01:00005151

Organization unit

Faculty of Science

ISBN

80-214-1885-0

Keywords in English

plasma;polymer;films;argon;acetylene;pecvd;pulsed;radio frequency;discharge;profile

Tags

acetylene, argon, discharge, films, PECVD, plasma, Polymer, profile, pulsed, radio frequency

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Abstract

V originále

Plasma polymer films were deposited from Argon and acetylene mixture by plasma enhanced chemical vapor deposition (PECVD) in pulsed radio frequency (13.56 MHz) discharges. The discharge on time varied from 50-150 ms and the off time was kept constant at 1900 ms. Rf power during the on time was set for 20 W. Deposition profiles along tubular plug-flow reactor were studied by spectroscopic ellipsometry in ultraviolet/visible range on films deposited on the silicon substrates.