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@inproceedings{384593, author = {Valtr, Miroslav and Zajíčková, Lenka and Rudakowski, Siegmar}, address = {Brno}, booktitle = {JUNIORMAT 01}, edition = {1. vyd.}, keywords = {plasma;polymer;films;argon;acetylene;pecvd;pulsed;radio frequency;discharge;profile}, language = {eng}, location = {Brno}, isbn = {80-214-1885-0}, pages = {277-278}, publisher = {ÚMI VUT FSI v Brně ve spolupráci s Českou společností pro nové materiály a technologie}, title = {Thin Films Deposited from Ar/C2H2 by Pulsed RF PECVD: Deposition Profiles in Tubular Plug-Flow Reactor}, year = {2001} }
TY - JOUR ID - 384593 AU - Valtr, Miroslav - Zajíčková, Lenka - Rudakowski, Siegmar PY - 2001 TI - Thin Films Deposited from Ar/C2H2 by Pulsed RF PECVD: Deposition Profiles in Tubular Plug-Flow Reactor PB - ÚMI VUT FSI v Brně ve spolupráci s Českou společností pro nové materiály a technologie CY - Brno SN - 8021418850 KW - plasma;polymer;films;argon;acetylene;pecvd;pulsed;radio frequency;discharge;profile N2 - Plasma polymer films were deposited from Argon and acetylene mixture by plasma enhanced chemical vapor deposition (PECVD) in pulsed radio frequency (13.56 MHz) discharges. The discharge on time varied from 50-150 ms and the off time was kept constant at 1900 ms. Rf power during the on time was set for 20 W. Deposition profiles along tubular plug-flow reactor were studied by spectroscopic ellipsometry in ultraviolet/visible range on films deposited on the silicon substrates. ER -
VALTR, Miroslav, Lenka ZAJÍČKOVÁ and Siegmar RUDAKOWSKI. Thin Films Deposited from Ar/C2H2 by Pulsed RF PECVD: Deposition Profiles in Tubular Plug-Flow Reactor. In \textit{JUNIORMAT 01}. 1. vyd. Brno: ÚMI VUT FSI v Brně ve spolupráci s Českou společností pro nové materiály a technologie, 2001, p.~277-278. ISBN~80-214-1885-0.
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