J 2001

X-ray diffraction from CuPt-ordered III-V ternary semiconductor alloy films

LI, J. H., J. KULIK and V. HOLY

Basic information

Original name

X-ray diffraction from CuPt-ordered III-V ternary semiconductor alloy films

Authors

LI, J. H., J. KULIK and V. HOLY

Edition

Phys. Rev. B, USA, The American Phys. Society, 2001, 0163-1829

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10302 Condensed matter physics

Country of publisher

Czech Republic

Confidentiality degree

není předmětem státního či obchodního tajemství

Impact factor

Impact factor: 3.070

RIV identification code

RIV/00216224:14310/01:00005202

Organization unit

Faculty of Science

UT WoS

000168215400062

Keywords in English

CHEMICAL-VAPOR-DEPOSITION; DOMAIN-STRUCTURES; LENGTH MISMATCH; PHASE EPITAXY; LAYERS; GAINP; GROWTH; PHOTOLUMINESCENCE; MECHANISM
Změněno: 16/1/2002 08:33, prof. RNDr. Václav Holý, CSc.

Abstract

V originále

A model has been developed to describe x-ray scattering from CuPt-type ordered III-V ternary semiconductor alloys. The model takes into account the size distribution of the two different laminae-shaped variants, the random distribution of antiphase domain boundaries in each variant, and the atomic displacements due to the bond-length difference between the two constitutive binary materials. A synchrotron x-ray source was employed to measure the weak-ordering reflections from CuPt-ordered Ga0.5In0.5P and Al0.5In0.5As samples. By comparing the experimental results and the model calculations, structure information, including the average number of atomic layers in the laminae of each variant, the average antiphase domain size, and the average order parameter in each variant, were obtained. Results from single-variant films and poorly ordered films are also discussed.

Links

GA202/00/0354, research and development project
Name: Procesy samouspořádání rozhraní při epitaxním růstu polovodičových supermřížek
Investor: Czech Science Foundation, Self-organization processes on the interfaces during epitaxial growth of semiconductor superlattices
VS96102, research and development project
Name: Laboratoř tenkých vrstev a nanostruktur
Investor: Ministry of Education, Youth and Sports of the CR, Laboratory of thin films and nanostructures