JANČA, Jan, Lenka ZAJÍČKOVÁ, Miloš KLÍMA and Pavel SLAVÍČEK. Diagnostics and Application of High Frequency Plasma Pencil (Diagnostics and Applications of High Frequency Plasma Pencil). Plasma Chemistry and Plasma Processing. Bristol, England: KLUWER ACADEMIC/PLENUM PUBLISHERS, 2001, 21 (2001), No 4, p. 565-580. ISSN 0272-4324. |
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@article{389372, author = {Janča, Jan and Zajíčková, Lenka and Klíma, Miloš and Slavíček, Pavel}, article_location = {Bristol, England}, article_number = {4}, keywords = {High frequency discharge; plasma sources; plasma teratment; plasma-liquid technologies}, language = {eng}, issn = {0272-4324}, journal = {Plasma Chemistry and Plasma Processing}, title = {Diagnostics and Application of High Frequency Plasma Pencil}, volume = {21 (2001)}, year = {2001} }
TY - JOUR ID - 389372 AU - Janča, Jan - Zajíčková, Lenka - Klíma, Miloš - Slavíček, Pavel PY - 2001 TI - Diagnostics and Application of High Frequency Plasma Pencil JF - Plasma Chemistry and Plasma Processing VL - 21 (2001) IS - 4 SP - 565 EP - 565 PB - KLUWER ACADEMIC/PLENUM PUBLISHERS SN - 02724324 KW - High frequency discharge KW - plasma sources KW - plasma teratment KW - plasma-liquid technologies N2 - High frequency plasma pencil is a source of highly active environment which can be generated at atmospheric, reduced or increased perssure. The discharge can be unipolar or bipolar.The plasma pensil discharge is studied by optical emission spectroscopy. Several technological aapplications like restation of archeological glass and metal artifacts, fragmentation of molecules for microelectrophoresis and plasma polymerization are summarized. ER -
JANČA, Jan, Lenka ZAJÍČKOVÁ, Miloš KLÍMA and Pavel SLAVÍČEK. Diagnostics and Application of High Frequency Plasma Pencil (Diagnostics and Applications of High Frequency Plasma Pencil). \textit{Plasma Chemistry and Plasma Processing}. Bristol, England: KLUWER ACADEMIC/PLENUM PUBLISHERS, 2001, 21 (2001), No~4, p.~565-580. ISSN~0272-4324.
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