SONNENFELD, Axel, T. M. TUN, Lenka ZAJÍČKOVÁ, K. V. KOZLOV, H.-E. WAGNER, J. F. BEHNKE and R. HIPPLER. Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison. Plasmas and Polymers. New York: KLUWER ACADEMIC/PLENUM PUBLISHERS, 2001, vol. 6, No 4, p. 266-295. ISSN 1084-0184. |
Other formats:
BibTeX
LaTeX
RIS
@article{402151, author = {Sonnenfeld, Axel and Tun, T. M. and Zajíčková, Lenka and Kozlov, K. V. and Wagner, H.andE. and Behnke, J. F. and Hippler, R.}, article_location = {New York}, article_number = {4}, keywords = {DBD}, language = {eng}, issn = {1084-0184}, journal = {Plasmas and Polymers}, title = {Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison}, volume = {6}, year = {2001} }
TY - JOUR ID - 402151 AU - Sonnenfeld, Axel - Tun, T. M. - Zajíčková, Lenka - Kozlov, K. V. - Wagner, H.-E. - Behnke, J. F. - Hippler, R. PY - 2001 TI - Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison JF - Plasmas and Polymers VL - 6 IS - 4 SP - 266 EP - 266 PB - KLUWER ACADEMIC/PLENUM PUBLISHERS SN - 10840184 KW - DBD N2 - Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison ER -
SONNENFELD, Axel, T. M. TUN, Lenka ZAJÍČKOVÁ, K. V. KOZLOV, H.-E. WAGNER, J. F. BEHNKE and R. HIPPLER. Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison. \textit{Plasmas and Polymers}. New York: KLUWER ACADEMIC/PLENUM PUBLISHERS, 2001, vol.~6, No~4, p.~266-295. ISSN~1084-0184.
|