SONNENFELD, Axel, T. M. TUN, Lenka ZAJÍČKOVÁ, K. V. KOZLOV, H.-E. WAGNER, J. F. BEHNKE and R. HIPPLER. Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison. Plasmas and Polymers. New York: KLUWER ACADEMIC/PLENUM PUBLISHERS, 2001, vol. 6, No 4, p. 266-295. ISSN 1084-0184.
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Basic information
Original name Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison
Authors SONNENFELD, Axel, T. M. TUN, Lenka ZAJÍČKOVÁ (203 Czech Republic, guarantor), K. V. KOZLOV, H.-E. WAGNER, J. F. BEHNKE and R. HIPPLER.
Edition Plasmas and Polymers, New York, KLUWER ACADEMIC/PLENUM PUBLISHERS, 2001, 1084-0184.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher United States of America
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/01:00005627
Organization unit Faculty of Science
Keywords in English DBD
Tags DBD
Tags International impact, Reviewed
Changed by Changed by: doc. Mgr. Lenka Zajíčková, Ph.D., učo 1414. Changed: 17/7/2007 17:51.
Abstract
Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison
Links
GA202/00/P037, research and development projectName: Plazmová depozice ochranných vrstev: charakterizace připravených vrstev a diagnostika užitého reaktivního plazmatu
Investor: Czech Science Foundation, Plasma deposition of protective coatings: characterisation of prepared films and diagnostics of reactive plasmas used
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