J 2002

Rf sputtering of composite SiOx/plasma polymer films and their basic properties

CHOUKOUROV, A., Y. PIHOSH, V. STELMASHUK, Hynek BIEDERMAN, D. SLAVÍNSKÁ et. al.

Basic information

Original name

Rf sputtering of composite SiOx/plasma polymer films and their basic properties

Authors

CHOUKOUROV, A. (804 Ukraine), Y. PIHOSH (804 Ukraine), V. STELMASHUK (804 Ukraine), Hynek BIEDERMAN (203 Czech Republic), D. SLAVÍNSKÁ (203 Czech Republic), M. KORMUNDA (203 Czech Republic) and Lenka ZAJÍČKOVÁ (203 Czech Republic, guarantor)

Edition

Surface & coatings technology, Elsevier Science, 2002, 0257-8972

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Netherlands

Confidentiality degree

není předmětem státního či obchodního tajemství

Impact factor

Impact factor: 1.267

RIV identification code

RIV/00216224:14310/02:00005643

Organization unit

Faculty of Science

UT WoS

000174011400044

Keywords in English

Rf magnetron; sputtering; SiOx; plasma polymer films

Tags

Tags

International impact, Reviewed
Změněno: 17/7/2007 17:57, doc. Mgr. Lenka Zajíčková, Ph.D.

Abstract

V originále

Rf sputtering of composite SiOx/plasma polymer films and their basic properties

Links

GA202/00/P037, research and development project
Name: Plazmová depozice ochranných vrstev: charakterizace připravených vrstev a diagnostika užitého reaktivního plazmatu
Investor: Czech Science Foundation, Plasma deposition of protective coatings: characterisation of prepared films and diagnostics of reactive plasmas used
MSM 143100003, plan (intention)
Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates