| RŮŽIČKA, Radovan, Miroslav ZABADAL and Petr KLÁN. Photolysis of Phenacyl Esters in a Two-Phase System. Synthetic Communications. New York: Marcel Dekker, 2002, vol. 32, No 16, p. 2581-2590. ISSN 0039-7911. |
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@article{403925,
author = {Růžička, Radovan and Zabadal, Miroslav and Klán, Petr},
article_location = {New York},
article_number = {16},
keywords = {photoremovable protecting groups; photochemistry},
language = {eng},
issn = {0039-7911},
journal = {Synthetic Communications},
title = {Photolysis of Phenacyl Esters in a Two-Phase System},
volume = {32},
year = {2002}
}
TY - JOUR
ID - 403925
AU - Růžička, Radovan - Zabadal, Miroslav - Klán, Petr
PY - 2002
TI - Photolysis of Phenacyl Esters in a Two-Phase System
JF - Synthetic Communications
VL - 32
IS - 16
SP - 2581
EP - 2581
PB - Marcel Dekker
SN - 00397911
KW - photoremovable protecting groups
KW - photochemistry
N2 - Phenacyl esters are useful photoremovable protecting groups for carboxylic acids in organic synthesis and biochemistry. In this work, simple one-pot arrangements of the phenacyl and 2,5-dimethylphenacyl ester photolysis are proposed. The reactions were performed in both the benzene/water two-phase system and in water. Cetyltrimethylamonium bromide was found to increase substantially the efficiency of the deprotection as well as the purity of the products by lowering the interfacial tension between the phases. Utilizing water as a medium significantly reduced the necessity to use environmentally malign organic solvents. The overall yields varied from 72 to 98 % depending on the reaction conditions.
ER -
RŮŽIČKA, Radovan, Miroslav ZABADAL and Petr KLÁN. Photolysis of Phenacyl Esters in a Two-Phase System. \textit{Synthetic Communications}. New York: Marcel Dekker, 2002, vol.~32, No~16, p.~2581-2590. ISSN~0039-7911.
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