Detailed Information on Publication Record
2002
Photolysis of Phenacyl Esters in a Two-Phase System
RŮŽIČKA, Radovan, Miroslav ZABADAL and Petr KLÁNBasic information
Original name
Photolysis of Phenacyl Esters in a Two-Phase System
Authors
RŮŽIČKA, Radovan (203 Czech Republic), Miroslav ZABADAL (203 Czech Republic) and Petr KLÁN (203 Czech Republic, guarantor)
Edition
Synthetic Communications, New York, Marcel Dekker, 2002, 0039-7911
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10401 Organic chemistry
Country of publisher
United States of America
Confidentiality degree
není předmětem státního či obchodního tajemství
Impact factor
Impact factor: 0.802
RIV identification code
RIV/00216224:14310/02:00005821
Organization unit
Faculty of Science
UT WoS
000177370300021
Keywords in English
photoremovable protecting groups; photochemistry
Tags
International impact
Změněno: 9/2/2007 14:21, prof. RNDr. Petr Klán, Ph.D.
Abstract
V originále
Phenacyl esters are useful photoremovable protecting groups for carboxylic acids in organic synthesis and biochemistry. In this work, simple one-pot arrangements of the phenacyl and 2,5-dimethylphenacyl ester photolysis are proposed. The reactions were performed in both the benzene/water two-phase system and in water. Cetyltrimethylamonium bromide was found to increase substantially the efficiency of the deprotection as well as the purity of the products by lowering the interfacial tension between the phases. Utilizing water as a medium significantly reduced the necessity to use environmentally malign organic solvents. The overall yields varied from 72 to 98 % depending on the reaction conditions.
Links
| GA203/02/0879, research and development project |
| ||
| MSM 143100005, plan (intention) |
|