Analysis of the boundaries of ZrO2 and HfO2 thin films by
atomic force microscopy and the combined optical method

J 2002

Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method

KLAPETEK, Petr, Ivan OHLÍDAL, Daniel FRANTA and Pavel POKORNÝ

Basic information

Original name

Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method

Authors

KLAPETEK, Petr (203 Czech Republic), Ivan OHLÍDAL (203 Czech Republic, guarantor), Daniel FRANTA (203 Czech Republic) and Pavel POKORNÝ (203 Czech Republic)

Edition

Surface and Interface Analysis, USA, John Wiley & Sons, 2002, 0142-2421

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10302 Condensed matter physics

Country of publisher

United States of America

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

Impact factor

Impact factor: 1.071

RIV identification code

RIV/00216224:14310/02:00006294

Organization unit

Faculty of Science

UT WoS

000176852600004

Keywords in English

ZrO2 and Hfo2 films; AFM; optical methods; rough upper boundaries

Abstract

V originále

In this paper an atomic force microscopy analysis of the microrough upper boundaries of ZrO2 and HfO2 thin films is presented. Within this analysis the values of the width, root-mean-square value of heights and power spectral density function of these boundaries are determined for ZrO2 and HfO2 exhibiting different thicknesses. The thickness dependences of the quantities mentioned are introduced. The values of the thicknesses of the films are evaluated using the combined optical method. This optical method is also used to describe boundary microroughness within the effective medium theory. A discussion of the results concerning the microroughness of the upper boundaries of both the ZrO2 and HfO2 thin films is also introduced.

Links

GA101/01/1104, research and development project

Name: Realizace laboratorního vzoru zařízení pro měření drsnosti povrchu metodou holografické interferometrie

Investor: Czech Science Foundation, Realisation of thelaboratory instrument for surface roughness measurement by holographic interferometry

GA202/01/1110, research and development project

Name: Optické a mechanické vlastnosti tenkých vrstev DLC:Si připravených PECVD metodou

Investor: Czech Science Foundation, Optical and mechanical properties of DLC : Si thin films prepared by the PECVD method

Citovat

KLAPETEK, Petr, Ivan OHLÍDAL, Daniel FRANTA and Pavel POKORNÝ. Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method. Surface and Interface Analysis. USA: John Wiley & Sons, 2002, vol. 34, No 1, p. 559-564. ISSN 0142-2421.

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   author = {Klapetek, Petr and Ohlídal, Ivan and Franta, Daniel and Pokorný, Pavel},
   article_location = {USA},
   article_number = {1},
   keywords = {ZrO2 and Hfo2 films; AFM; optical methods; rough upper boundaries},
   language = {eng},
   issn = {0142-2421},
   journal = {Surface and Interface Analysis},
   title = {Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method},
   url = {http://www.physics.muni.cz/~franta/bib/SIA34_559.html},
   volume = {34},
   year = {2002}
}

TY  - JOUR
ID  - 404727
AU  - Klapetek, Petr - Ohlídal, Ivan - Franta, Daniel - Pokorný, Pavel
PY  - 2002
TI  - Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method
JF  - Surface and Interface Analysis
VL  - 34
IS  - 1
SP  - 559
EP  - 559
PB  - John Wiley & Sons
SN  - 01422421
KW  - ZrO2 and Hfo2 films
KW  - AFM
KW  - optical methods
KW  - rough upper boundaries
UR  - http://www.physics.muni.cz/~franta/bib/SIA34_559.html
N2  - In this paper an atomic force microscopy analysis of the microrough upper boundaries of ZrO2 and HfO2 thin films is presented. Within this analysis the values of the width, root-mean-square value of heights and power spectral density function of these boundaries are determined for ZrO2 and HfO2 exhibiting different thicknesses. The thickness dependences of the quantities mentioned are introduced. The values of the thicknesses of the films are evaluated using the combined optical method. This optical method is also used to describe boundary microroughness within the effective medium theory. A discussion of the results concerning the microroughness of the upper boundaries of both the ZrO2 and HfO2 thin films is also introduced.
ER  -

KLAPETEK, Petr, Ivan OHLÍDAL, Daniel FRANTA and Pavel POKORNÝ. Analysis of the boundaries of ZrO2 and HfO2 thin films by atomic force microscopy and the combined optical method. \textit{Surface and Interface Analysis}. USA: John Wiley \&{} Sons, 2002, vol.~34, No~1, p.~559-564. ISSN~0142-2421.

Detailed Information on Publication Record