X-ray reflectivity study of a W/Si multilayer grating

J 2001

X-ray reflectivity study of a W/Si multilayer grating

JERGEL, M., C. FALCONY, Petr MIKULÍK, L. ORTEGA, E. MAJKOVÁ et. al.

Basic information

Original name

X-ray reflectivity study of a W/Si multilayer grating

Authors

JERGEL, M. (703 Slovakia), C. FALCONY (484 Mexico), Petr MIKULÍK (203 Czech Republic, guarantor), L. ORTEGA (250 France), E. MAJKOVÁ (703 Slovakia), E. PINČÍK (703 Slovakia), Š. LUBY (703 Slovakia), I. KOSTIČ (703 Slovakia) and P. HUDEK (703 Slovakia)

Edition

Superficies y Vacío, Mexico, Sociedad Mexicana de Ciencia de Superfic, 2001, 1665-3521

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10302 Condensed matter physics

Country of publisher

Mexico

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

RIV identification code

RIV/00216224:14310/01:00006979

Organization unit

Faculty of Science

Keywords in English

reflectivity; xrr; x-uv optics; gratings; w/si; x-ray

Abstract

V originále

Multilayer gratings are artificially patterned multilyer thin films with the periodicities both in the lateral and normal directions which renders them attracting for microelectronic and optical applications. A proper structural characterization is of primary importance. To test the capability of the X-ray reflectometry technique to fulfil this task, a tungsten/silicon multilayer grating prepared by electron beam evaporation and electron beam lithography was studied both in the coplanar and non-coplanar geometries., the nominal lateral and normal periods being 800 nm and 8 nm, respectively. The coplanar measurements were evaluated within the dynamical theory of X-ray scattering on rough gratings and provided the structural parameters of a real structure with a reasonable precision which are close to the nominal ones. The results revealed also some imperfections of the deposition and masking procedures which are discussed. The non-coplanar measurements were evaluated qualitatively using three-dimensional constructions in the reciprocal space. The advantage of the technique used is its non-destructive character and a simultaneous access both to the surface shape of the grating as well as to its internal structure.

Links

GA202/99/P064, research and development project

Name: Studium morfologie rozhraní epitaxních multivrstev RTG reflexí

Investor: Czech Science Foundation, Study of the interface morphology in epitaxial multilayers by X-ray reflection

MSM 143100002, plan (intention)

Name: Fyzikální vlastnosti nových materiálů a vrstevnatých struktur

Investor: Ministry of Education, Youth and Sports of the CR, Physical properties of new materials and layered structures

VS96102, research and development project

Name: Laboratoř tenkých vrstev a nanostruktur

Investor: Ministry of Education, Youth and Sports of the CR, Laboratory of thin films and nanostructures

Citovat

JERGEL, M., C. FALCONY, Petr MIKULÍK, L. ORTEGA, E. MAJKOVÁ, E. PINČÍK, Š. LUBY, I. KOSTIČ and P. HUDEK. X-ray reflectivity study of a W/Si multilayer grating. Superficies y Vacío. Mexico: Sociedad Mexicana de Ciencia de Superfic, 2001, vol. 2001, No 13, p. 10-14. ISSN 1665-3521.

@article{407469,
   author = {Jergel, M. and Falcony, C. and Mikulík, Petr and Ortega, L. and Majková, E. and Pinčík, E. and Luby, Š. and Kostič, I. and Hudek, P.},
   article_location = {Mexico},
   article_number = {13},
   keywords = {reflectivity; xrr; x-uv optics; gratings; w/si; x-ray},
   language = {eng},
   issn = {1665-3521},
   journal = {Superficies y Vacío},
   title = {X-ray reflectivity study of a W/Si multilayer grating},
   url = {http://www.sci.muni.cz/~mikulik/Publications.html#JergelFalconyMikulikOMPLKH-SyV-2001},
   volume = {2001},
   year = {2001}
}

TY  - JOUR
ID  - 407469
AU  - Jergel, M. - Falcony, C. - Mikulík, Petr - Ortega, L. - Majková, E. - Pinčík, E. - Luby, Š. - Kostič, I. - Hudek, P.
PY  - 2001
TI  - X-ray reflectivity study of a W/Si multilayer grating
JF  - Superficies y Vacío
VL  - 2001
IS  - 13
SP  - 10
EP  - 10
PB  - Sociedad Mexicana de Ciencia de Superfic
SN  - 16653521
KW  - reflectivity
KW  - xrr
KW  - x-uv optics
KW  - gratings
KW  - w/si
KW  - x-ray
UR  - http://www.sci.muni.cz/~mikulik/Publications.html#JergelFalconyMikulikOMPLKH-SyV-2001
N2  - Multilayer gratings are artificially patterned multilyer thin films with the periodicities both in the lateral and normal directions which renders them attracting for microelectronic and optical applications. A proper structural characterization is of primary importance. To test the capability of the X-ray reflectometry technique to fulfil this task, a tungsten/silicon multilayer grating prepared by electron beam evaporation and electron beam lithography was studied both in the coplanar and non-coplanar geometries., the nominal lateral and normal periods being 800 nm and 8 nm, respectively. The coplanar measurements were evaluated within the dynamical theory of X-ray scattering on rough gratings and provided the structural parameters of a real structure with a reasonable precision which are close to the nominal ones. The results revealed also some imperfections of the deposition and masking procedures which are discussed. The non-coplanar measurements were evaluated qualitatively using three-dimensional constructions in the reciprocal space. The advantage of the technique used is its non-destructive character and a simultaneous access both to the surface shape of the grating as well as to its internal structure.
ER  -

JERGEL, M., C. FALCONY, Petr MIKULÍK, L. ORTEGA, E. MAJKOVÁ, E. PINČÍK, Š. LUBY, I. KOSTIČ and P. HUDEK. X-ray reflectivity study of a W/Si multilayer grating. \textit{Superficies y Vacío}. Mexico: Sociedad Mexicana de Ciencia de Superfic, 2001, vol.~2001, No~13, p.~10-14. ISSN~1665-3521.

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